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Inventor

Toshiyuki Sawada

Inventor
Himeji, JP

Overview

27→
Patents
2010–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 27 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C22Cprimary
C22CAlloys27%
B22FWorking metallic powder16%
H01FMagnets8%
C23CCoating metallic material6%
C21DModifying the physical structure of ferrous metals5%
B23KSoldering or unsoldering4%
G11BInformation storage based on relative movement between record carrier and transducer4%
H05KPrinted circuits4%
Y10TTechnical subjects covered by former us classification4%
B24CAbrasive or related blasting with particulate material3%
PatentTitleYear
11,000,954Robot device, method of controlling robot device, computer program, and program storage medium202110,872,716Soft magnetic flaky powder and method for producing the same202010,804,014Flat soft magnetic powder and production method therefor202010,586,637Soft magnetic flattened powder and method for producing the same202010,576,539Flat soft magnetic powder and production method therefor202010,551,410Inspection device202010,543,571Cu-added Ni--Cr--Fe-based alloy brazing material202010,509,069Inspection device201910,273,838Valve seat insert for internal combustion engine having excellent wear resistance201910,265,767Alloy powder, and shot material for shot peening, powder metallurgical composition and iron-based sintered alloy using the same201910,058,922Compact for producing a sintered alloy, a wear-resistant iron-based sintered alloy, and a method for producing the same20189,950,369Manufacturing method of sintered alloy, compact for sintering, and sintered alloy20189,656,371'High-hardness atomized powder, powder for projecting material for shot peening, and shot peening method using same'20179,508,990'Si-based-alloy anode material'20169,458,529'High-hardness shot material for shot peening and shot peening method'20169,440,329'Shot peening method with which high compressive residual stress is obtained'20169,397,334'Si alloy powder for negative electrode of lithium-ion secondary cell, and method for manufacturing same'20169,293,166'Sputtering target material for producing intermediate layer film of perpendicular magnetic recording medium and thin film produced by using the same'20169,208,812'Soft magnetic alloy for magnetic recording medium, sputtering target material, and magnetic recording medium'20159,114,485'Ti-based brazing filler metal and method for producing the same'20158,978,959'Ni—Fe-based alloy brazing filler material'20158,080,201'Method for producing sputtering target material for Ni-W based interlayer'20118,066,825'(CoFe)Zr/Nb/Ta/Hf based target material'20118,057,650'Soft magnetic FeCo based target material'20117,942,985'Alloy for soft magnetic layer in perpendicular magnetic recording medium'20117,780,826'Cr-doped FeCoB based target material and method for producing the same'20107,757,396'Raw material powder for laser clad valve seat and valve seat using the same'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2020Patents assigned to SANYO SPECIAL STEEL CO LTD (24)· patent assignee history
2010–2020Based in Himeji, JP· patent location history
2011–2017Patents assigned to SAWADA TOSHIYUKI (10)· patent assignee history
2011–2016Patents assigned to YANAGITANI AKIHIKO (4)· patent assignee history
2011Patents assigned to AIKAWA YOSHIKAZU (2)· patent assignee history
2018Patents assigned to FINE SINTER CO LTD (2)· patent assignee history
2019–2020Based in Toyota, JP· patent location history
2019Based in Hyogo, JP· patent location history
2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SANYO SPECIAL STEEL CO LTD242010–2020
SAWADA TOSHIYUKIself102011–2017
YANAGITANI AKIHIKO42011–2016
AIKAWA YOSHIKAZU22011
FINE SINTER CO LTD22018
Locations
LocationPatentsSpan
Himeji, JP232010–2020
Toyota, JP22019–2020
Tokyo, JP12021
Hyogo, JP12019