Inventor

Kazufumi Sato

Inventor

Sagamihara, JP

Overview

1991–2019

Patent span

Physics

Primary field (CPC G)

Patents· 43 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests34%

C07CAcyclic or carbocyclic compounds3%

B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%

C22CAlloys2%

C22FChanging the physical structure of non-ferrous metals and non-ferrous alloys2%

H01QAntennas, i.e. radio aerials2%

Y10TTechnical subjects covered by former us classification2%

B23KSoldering or unsoldering1%

B29CShaping or joining of plastics1%

PatentTitleYear

10,344,359Aluminum alloy clad sheet and aluminum alloy clad structural member2019 10,272,645Aluminum-alloy-clad plate and aluminum-alloy-clad structural member2019 9,964,851Resist pattern forming method and developer for lithography2018 8,828,304'Method of forming resist pattern by nanoimprint lithography'2014 8,216,763'Photosensitive resin composition and method of forming pattern'2012 7,666,569'Positive resist composition and method for forming resist pattern'2010 6,890,697'Positive-working chemical-amplification photoresist composition'2005 6,869,745'Positive-working chemical-amplification photoresist composition'2005 6,818,380'Method for the preparation of a semiconductor device'2004 6,815,144'Positive-working chemical-amplification photoresist composition'2004 6,787,290'Positive-working photoresist composition and resist patterning method using same'2004 6,777,158'Method for the preparation of a semiconductor device'2004 6,773,863'Positive-working chemical-amplification photoresist composition'2004 6,677,103'Positive-working photoresist composition'2004 6,673,516'Coating composition for chemically amplified positive resist and method of patterning resist using the same'2004 6,638,684'Photosensitive laminate, process for forming resist pattern using same and positive resist composition'2003 RE038254'Positive resist composition'2003 6,548,229'Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same'2003 6,444,394'Positive-working photoresist composition'2002 6,388,101'Chemical-sensitization photoresist composition'2002 6,387,587'Positive-working chemical-amplification photoresist composition'2002 6,284,430'Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same'2001 6,255,041'Method for formation of patterned resist layer'2001 6,245,930'Chemical-sensitization resist composition'2001 6,225,476'Positive-working photoresist composition'2001 6,159,652'Positive resist composition'2000 6,087,063'Positive-working photoresist composition'2000 6,077,644'Positive-working resist composition'2000 5,976,760'Chemical-sensitization resist composition'1999 5,955,240'Positive resist composition'1999 5,948,589'Positive-working photoresist composition'1999 5,945,517'Chemical-sensitization photoresist composition'1999 5,945,248'Chemical-sensitization positive-working photoresist composition'1999 5,929,271'Compounds for use in a positive-working resist composition'1999 5,908,730'Chemical-sensitization photoresist composition'1999 5,874,195'Positive-working photoresist composition'1999 5,856,058'Chemical-sensitization positive-working photoresist composition'1999 5,854,357'Process for the production of polyhydroxstyrene'1998 5,817,444'Positive-working photoresist composition and multilayered resist material using the same'1998 5,770,343'Positive-working photoresist composition'1998 5,736,296'Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound'1998 5,483,132'Control device for motor-driven telescopic antenna'1996 4,990,836'Motorized automobile antenna control device'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–1996Patents assigned to HARADA IND CO LTD (2)· patent assignee history

1991–1996Based in Tokyo, JP· patent location history

1998–2018Patents assigned to TOKYO OHKA KOGYO CO LTD (39)· patent assignee history

1998–2005Based in Sagamihara, JP· patent location history

2003–2014Based in Kanagawa, JP· patent location history

2003–2018Based in Kawasaki, JP· patent location history

2012–2014Patents assigned to SATO KAZUFUMI (2)· patent assignee history

2012–2014Patents assigned to YAMADA TOMOTAKA (2)· patent assignee history

2019Patents assigned to KOBE STEEL LTD (2)· patent assignee history

2019Based in Kobe, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOKYO OHKA KOGYO CO LTD	39	1998–2018
HARADA IND CO LTD	2	1991–1996
KOBE STEEL LTD	2	2019
SATO KAZUFUMIself	2	2012–2014
YAMADA TOMOTAKA	2	2012–2014

Locations

Location	Patents	Span
Sagamihara, JP	32	1998–2005
Kanagawa, JP	4	2003–2014
Kawasaki, JP	3	2003–2018
Kobe, JP	2	2019
Tokyo, JP	2	1991–1996