Inventor
Kouichi Misumi
Inventor
Kanagawa, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices57%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests43%
PatentTitleYear
7,419,769'Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same'20087,129,018'Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same'20067,063,934'Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same'20066,641,972'Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2008Patents assigned to TOKYO OHKA KOGYO CO LTD (2)· patent assignee history
2003–2008Based in Kanagawa, JP· patent location history
2006Patents assigned to TOYKO OHKA KOGYO CO LTD (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 2 | 2003–2008 |
| TOYKO OHKA KOGYO CO LTD | 2 | 2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 4 | 2003–2008 |