Inventor
Ashim Dutta
Inventor
Menands, NY, US
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10BElectronic memory devices12%
H10NElectric solid-state devices not otherwise provided for12%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
G11CStatic stores7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
H01JElectric discharge tubes or discharge lamps5%
C23CCoating metallic material2%
H01FMagnets2%
PatentTitleYear
10,879,107Method of forming barrier free contact for metal interconnects202010,833,257Formation of embedded magnetic random-access memory devices with multi-level bottom electrode via contacts202010,833,258MRAM device formation with in-situ encapsulation202010,796,911Hardmask stress, grain, and structure engineering for advanced memory applications202010,707,413Formation of embedded magnetic random-access memory devices202010,685,879Lithographic alignment of a conductive line to a via202010,672,618Systems and methods for patterning features in tantalum nitride (TaN) layer202010,672,611Hardmask stress, grain, and structure engineering for advanced memory applications202010,656,527Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer202010,615,037Tone reversal during EUV pattern transfer using surface active layer assisted selective deposition202010,539,884Post-lithography defect inspection using an e-beam inspection tool20209,984,977Semiconductor constructions20189,679,852'Semiconductor constructions'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017–2018Patents assigned to MICRON TECHNOLOGY INC (2)· patent assignee history
2017–2018Based in Boise, ID, US· patent location history
2020Patents assigned to IBM (11)· patent assignee history
2020Patents assigned to TOKYO ELECTRON LTD (1)· patent assignee history
2020Based in Menands, NY, US· patent location history
2020Based in Albany, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 11 | 2020 |
| MICRON TECHNOLOGY INC | 2 | 2017–2018 |
| TOKYO ELECTRON LTD | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Menands, New York, US | 9 | 2020 |
| Albany, New York, US | 2 | 2020 |
| Boise, ID, US | 2 | 2017–2018 |