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Inventor

Eva Mondt

Inventor
Eindhoven, NL

Overview

11→
Patents
2010–2019
Patent span
Physics
Primary field (CPC G)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices57%
C02FTreatment of water, waste water, sewage, or sludge14%
A47LDomestic washing or cleaning7%
A61LMethods or apparatus for sterilising materials or objects in general7%
B01DSeparation7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
PatentTitleYear
10,268,127Lithographic apparatus and device manufacturing method20199,645,506'Lithographic apparatus and device manufacturing method'20179,242,194'Device for purifying a fluid'20169,040,938'Device comprising a source for emitting ultraviolet light'20158,675,172'Lithographic apparatus and method of removing liquid'20148,634,053'Lithographic apparatus and device manufacturing method'20148,634,052'Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table'20148,614,424'Device comprising means for guiding fluid from an inlet to an outlet'20138,416,383'Lithographic apparatus and method'20138,274,641'Substrate table, lithographic apparatus and device manufacturing method'20127,692,765'Lithographic apparatus and method of removing liquid'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2019Patents assigned to ASML NETHERLANDS BV (8)· patent assignee history
2010–2019Based in Eindhoven, NL· patent location history
2012–2016Patents assigned to MONDT EVA (8)· patent assignee history
2012–2014Patents assigned to JACOBS HERNES (3)· patent assignee history
2012–2014Patents assigned to RIEPEN MICHEL (3)· patent assignee history
2013–2016Patents assigned to KONINKL PHILIPS NV (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV82010–2019
MONDT EVAself82012–2016
JACOBS HERNES32012–2014
KONINKL PHILIPS NV32013–2016
RIEPEN MICHEL32012–2014
Locations
LocationPatentsSpan
Eindhoven, NL112010–2019