Inventor
Hong Chen
Inventor
San Jose, CA, US
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
G06FElectric digital data processing15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H01LSemiconductor devices11%
H10DInorganic electric semiconductor devices11%
G16BBioinformatics, i.e. information and communication technology [ict] specially adapted for genetic or protein-related data processing in computational molecular biology7%
H10KOrganic electric solid-state devices7%
G06VImage or video recognition or understanding4%
G16CComputational chemistry4%
H04BTransmission4%
PatentTitleYear
10,424,396Computation pipeline of location-dependent variant calls201910,424,395Computation pipeline of single-pass multiple variant calls20199,929,217'Array substrate of display and method of manufacturing the same'20189,331,107'Pixel structure'20169,331,106'Pixel structure and fabrication method thereof'20169,262,579'Integration of lithography apparatus and mask optimization process with multiple patterning process'20168,819,601'Integration of lithography apparatus and mask optimization process with multiple patterning process'20148,739,082'Method of pattern selection for source and mask optimization'20148,572,521'Method for performing pattern decomposition for a full chip design'20138,541,779'Pixel structure of organic electroluminescence apparatus'20138,543,947'Selection of optimum patterns in a design layout based on diffraction signature analysis'20137,627,301'Spatial diversity receiving device and input channel switching method'20096,891,971'Recognition process'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009Based in Shenzhen, CN· patent location history
2013–2016Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2013–2018Patents assigned to AU OPTRONICS CORP (4)· patent assignee history
2013–2014Patents assigned to CHEN HONG (4)· patent assignee history
2013–2014Patents assigned to CHEN LUOQI (4)· patent assignee history
2013–2014Patents assigned to LI JIANGWEI (2)· patent assignee history
2013–2019Based in San Jose, CA, US· patent location history
2013Based in Taipei, TW· patent location history
2016Based in Keelung, TW· patent location history
2018Based in Hsinchu, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 4 | 2013–2016 |
| AU OPTRONICS CORP | 4 | 2013–2018 |
| CHEN HONGself | 4 | 2013–2014 |
| CHEN LUOQI | 4 | 2013–2014 |
| LI JIANGWEI | 2 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 7 | 2013–2019 |
| Keelung, TW | 2 | 2016 |
| Hsinchu, TW | 1 | 2018 |
| Taipei, TW | 1 | 2013 |
| Shenzhen, CN | 1 | 2009 |