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Inventor

Mark S. Kaplan

Inventor
Webster, NY, US

Overview

2→
Patents
1986–1996
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Cprimary
G03CPhotosensitive materials for photographic purposes29%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests29%
B41MPrinting, duplicating, marking, or copying processes14%
G11BInformation storage based on relative movement between record carrier and transducer14%
Y10TTechnical subjects covered by former us classification14%
PatentTitleYear
5,506,093'Imaging element for reductive laser-imaging'19964,619,890'Optical recording element having a polymerized crosslinked homopolymer smoothing layer'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1986–1996Patents assigned to EASTMAN KODAK CO (2)· patent assignee history
1986–1996Based in Webster, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EASTMAN KODAK CO21986–1996
Locations
LocationPatentsSpan
Webster, New York, US21986–1996