Inventor
Kazuyuki Nitta
Inventor
Ebina, JP
Overview
Patents· 32 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices63%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests37%
PatentTitleYear
8,399,173'Resist composition and resist pattern forming method'20137,407,739'Resist developer and resist pattern formation method using same'20087,402,372'Positive resist composition and method of forming resist pattern'20087,358,028'Chemically amplified positive photo resist composition and method for forming resist pattern'20087,329,478'Chemical amplified positive photo resist composition and method for forming resist pattern'20087,232,643'Positive resist composition and compound used therein'20077,192,687'Positive resist composition and method of forming resist pattern using same'20077,150,956'Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device'20067,094,924'Method for decreasing surface defects of patterned resist layer'20066,921,621'Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device'20056,818,380'Method for the preparation of a semiconductor device'20046,787,290'Positive-working photoresist composition and resist patterning method using same'20046,777,158'Method for the preparation of a semiconductor device'20046,677,103'Positive-working photoresist composition'20046,638,684'Photosensitive laminate, process for forming resist pattern using same and positive resist composition'2003RE038254'Positive resist composition'20036,605,417'Method for decreasing surface defects of patterned resist layer'20036,444,394'Positive-working photoresist composition'20026,159,652'Positive resist composition'20005,955,240'Positive resist composition'19995,948,589'Positive-working photoresist composition'19995,945,517'Chemical-sensitization photoresist composition'19995,945,248'Chemical-sensitization positive-working photoresist composition'19995,908,730'Chemical-sensitization photoresist composition'19995,874,195'Positive-working photoresist composition'19995,856,058'Chemical-sensitization positive-working photoresist composition'19995,854,357'Process for the production of polyhydroxstyrene'19985,817,444'Positive-working photoresist composition and multilayered resist material using the same'19985,800,964'Photoresist composition'19985,770,343'Positive-working photoresist composition'19985,736,296'Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound'19985,728,504'Positive photoresist compositions and multilayer resist materials using the same'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2013Patents assigned to TOKYO OHKA KOGYO CO LTD (31)· patent assignee history
1998–2006Based in Ebina, JP· patent location history
1998–2003Based in Kanagawa, JP· patent location history
1998Based in Koza-gun, JP· patent location history
1999Patents assigned to DAITO CHEMIX CORP (1)· patent assignee history
2003–2013Based in Kawasaki, JP· patent location history
2007–2013Patents assigned to NITTA KAZUYUKI (2)· patent assignee history
2007Based in Nakahara, JP· patent location history
2013Patents assigned to FUJITA SHOICHI (1)· patent assignee history
2013Patents assigned to OZAKI HIROKAZU (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 31 | 1998–2013 |
| NITTA KAZUYUKIself | 2 | 2007–2013 |
| DAITO CHEMIX CORP | 1 | 1999 |
| FUJITA SHOICHI | 1 | 2013 |
| OZAKI HIROKAZU | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ebina, JP | 13 | 1998–2006 |
| Kanagawa, JP | 10 | 1998–2003 |
| Kawasaki, JP | 7 | 2003–2013 |
| Nakahara, JP | 1 | 2007 |
| Koza-gun, JP | 1 | 1998 |