Inventor
Randolph J. Smith
Inventor
Newburgh, NY, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices64%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests36%
PatentTitleYear
6,383,712'Polymer-bound sensitizer'20026,136,498'Polymer-bound sensitizer'20006,074,800'Photo acid generator compounds, photo resists, and method for improving bias'20005,561,194'Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene'19965,547,812'Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer'19965,362,599'Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds'19945,296,332'Crosslinkable aqueous developable photoresist compositions and method for use thereof'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2002Patents assigned to IBM (7)· patent assignee history
1994–2002Based in Newburgh, NY, US· patent location history
1996Based in Orange County, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 7 | 1994–2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Newburgh, New York, US | 5 | 1994–2002 |
| Orange County, New York, US | 2 | 1996 |