Inventor
EUN HYEA KO
Inventor
KR
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices19%
H10DInorganic electric semiconductor devices19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
B82YSpecific uses or applications of nanostructures14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
C23CCoating metallic material5%
C23FNon-mechanical removal of metallic material from surface5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
PatentTitleYear
12,588,478Method of fabricating semiconductor device including organic and silicon oxide layers202612,557,370Semiconductor device manufacturing method202612,500,079Semiconductor device manufacturing method202511,901,191Atomic layer etching method and semiconductor device manufacturing method using the same2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024–2026Patents assigned to SAMSUNG ELECTRONICS CO LTD (4)· patent assignee history
2024Patents assigned to DNF CO LTD (1)· patent assignee history
2024–2026Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 4 | 2024–2026 |
| DNF CO LTD | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 4 | 2024–2026 |