Inventor

Toralf Gruner

Inventor

Aalen, DE

Overview

2003–2021

Patent span

Physics

Primary field (CPC G)

Patents· 113 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices49%

G02BOptical elements, systems or apparatus29%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%

G21KHandling of particles or ionising radiation not otherwise provided for3%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%

B24BMachines, devices, or processes for grinding or polishing1%

B82YSpecific uses or applications of nanostructures1%

G01BMeasuring length, thickness or similar linear dimensions1%

H05GX-ray technique1%

PatentTitleYear

11,054,755Optical module with an anticollision device for module components2021 11,029,515Optical element, and method for correcting the wavefront effect of an optical element2021 11,003,088Method and device for the correction of imaging defects2021 10,908,509Mirror, in particular for a microlithographic projection exposure apparatus2021 10,684,466Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangement2020 10,620,543Method and device for the correction of imaging defects2020 10,591,825Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography2020 10,578,976Catadioptric projection objective including a reflective optical component and a measuring device2020 10,416,569Attenuation filter for projection lens, projection lens having attenuation filter for projection exposure apparatus, and projection exposure apparatus having projection lens2019 10,345,710Microlithographic projection exposure apparatus and measuring device for a projection lens2019 10,288,894Optical component for use in a radiation source module of a projection exposure system2019 10,281,824Microlithography projection objective2019 10,261,425Projection exposure apparatus with a highly flexible manipulator2019 10,162,270Projection exposure apparatus comprising a measuring system for measuring an optical element2018 10,162,267Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations2018 10,146,137Catadioptric projection objective including a reflective optical component and a measuring device2018 10,120,176Catadioptric projection objective comprising deflection mirrors and projection exposure method2018 10,067,424Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus2018 10,048,592Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography2018 10,042,146Catadioptric projection objective2018 10,012,911Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator2018 10,001,631Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element2018 9,946,161Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method2018 9,933,710Projection exposure method and projection exposure apparatus2018 9,817,220'Catadioptric projection objective comprising deflection mirrors and projection exposure method'2017 9,785,054'Mirror, more particularly for a microlithographic projection exposure apparatus'2017 9,759,550'Projection exposure apparatus for microlithography comprising an optical distance measurement system'2017 9,733,395'Microlithographic projection exposure apparatus'2017 9,726,870'Catadioptric projection objective'2017 9,714,822'Projection exposure apparatus for microlithography comprising an optical distance measurement system'2017 9,696,631'Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system'2017 9,684,251'Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus'2017 9,671,703'Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement'2017 9,665,006'Projection exposure method and projection exposure apparatus for microlithography'2017 9,581,813'Method for improving the imaging properties of a projection objective, and such a projection objective'2017 9,459,435'Catadioptric projection objective comprising deflection mirrors and projection exposure method'2016 9,436,095'Exposure apparatus and measuring device for a projection lens'2016 9,360,775'Method of manufacturing a projection objective and projection objective'2016 9,310,693'Method for operating a projection exposure tool and control apparatus'2016 9,279,969'Catadioptric projection objective'2016 9,274,327'Catadioptric projection objective comprising deflection mirrors and projection exposure method'2016 9,164,396'Projection lens system of a microlithographic projection exposure installation'2015 9,146,475'Projection exposure system and projection exposure method'2015 9,097,984'Microlithography projection objective'2015 9,086,637'Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system'2015 9,081,310'Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same'2015 9,069,263'Method for improving the imaging properties of a projection objective, and such a projection objective'2015 9,046,787'Microlithographic projection exposure apparatus'2015 8,896,814'Catadioptric projection objective comprising deflection mirrors and projection exposure method'2014 8,891,172'Optical element and method'2014 8,873,137'Catadioptric projection objective'2014 8,854,606'Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system'2014 8,767,181'Microlithographic exposure method as well as a projection exposure system for carrying out the method'2014 8,659,744'Method for correcting a lithography projection objective, and such a projection objective'2014 8,542,342'Method of manufacturing a miniaturized device'2013 8,508,854'Optical element and method'2013 8,446,665'Catadioptric projection objective'2013 RE044216'Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection'2013 8,436,985'Combination stop for catoptric projection arrangement'2013 8,379,188'Optical system'2013 8,330,935'Exposure apparatus and measuring device for a projection lens'2012 8,325,323'Method and system for correcting image changes'2012 8,325,322'Optical correction device'2012 8,325,426'Projection objective of a microlithographic projection exposure apparatus'2012 8,319,944'Projection lens system of a microlithographic projection exposure installation'2012 8,310,752'Method of manufacturing a projection objective and projection objective'2012 8,305,558'Illumination system for a microlithography projection exposure apparatus'2012 8,300,211'Catadioptric projection objective'2012 8,294,991'Interference systems for microlithgraphic projection exposure systems'2012 8,248,578'Projection exposure method and projection exposure system therefor'2012 8,237,918'Optical system of a microlithographic projection exposure apparatus'2012 8,208,127'Combination stop for catoptric projection arrangement'2012 8,174,676'Method for correcting a lithography projection objective, and such a projection objective'2012 8,159,648'Method and device for the correction of imaging defects'2012 7,982,969'Projection objective of a microlithographic projection exposure apparatus'2011 7,982,854'Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system'2011 7,961,297'Method for determining intensity distribution in the image plane of a projection exposure arrangement'2011 7,920,275'Optical system of a microlithographic projection exposure apparatus'2011 7,847,921'Microlithographic exposure method as well as a projection exposure system for carrying out the method'2010 7,808,615'Projection exposure apparatus and method for operating the same'2010 7,782,440'Projection lens system of a microlithographic projection exposure installation'2010 7,777,963'Method for improving the imaging properties of a projection objective, and such a projection objective'2010 7,733,501'Optical system of a microlithographic projection exposure apparatus'2010 7,719,658'Imaging system for a microlithographical projection light system'2010 7,672,044'Lens made of a crystalline material'2010 7,589,903'Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method'2009 7,551,263'Device for adjusting the illumination dose on a photosensitive layer'2009 7,508,489'Method of manufacturing a miniaturized device'2009 7,463,422'Projection exposure apparatus'2008 7,460,206'Projection objective for immersion lithography'2008 7,456,933'Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus'2008 7,423,765'Optical system of a microlithographic projection exposure apparatus'2008 7,408,616'Microlithographic exposure method as well as a projection exposure system for carrying out the method'2008 7,405,808'Optical system, in particular illumination system, of a microlithographic projection exposure apparatus'2008 7,382,536'Objective with fluoride crystal lenses'2008 7,355,791'Optical system and photolithography tool comprising same'2008 7,321,465'Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses'2008 7,292,388'Lens made of a crystalline material'2007 7,286,284'Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection'2007 7,256,932'Optical system for ultraviolet light'2007 7,239,450'Method of determining lens materials for a projection exposure apparatus'2007 7,180,667'Objective with fluoride crystal lenses'2007 7,145,720'Objective with fluoride crystal lenses'2006 7,126,765'Objective with fluoride crystal lenses'2006 7,079,331'Device for holding a beam splitter element'2006 7,068,436'Projection lens for a microlithographic projection exposure apparatus'2006 7,031,069'Microlithographic illumination method and a projection lens for carrying out the method'2006 7,027,237'Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method'2006 6,963,449'Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method'2005 6,842,294'Catadioptric objective'2005 6,806,942'Projection exposure system'2004 6,728,043'Microlithographic illumination method and a projection lens for carrying out the method'2004 6,593,998'Projection exposure system'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2010Patents assigned to ZEISS CARL SMT AG (33)· patent assignee history

2003Based in Oberkochen, DE· patent location history

2004–2006Based in Chemnitz, DE· patent location history

2004–2005Based in Koenigsbronn, DE· patent location history

2005–2006Based in KÃ¶nigsbronn, DE· patent location history

2006–2021Based in Aalen, DE· patent location history

2011–2021Patents assigned to ZEISS CARL SMT GMBH (75)· patent assignee history

2012–2018Patents assigned to GRUNER TORALF (32)· patent assignee history

2012–2017Patents assigned to FELDMANN HEIKO (8)· patent assignee history

2012–2014Patents assigned to TOTZECK MICHAEL (7)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ZEISS CARL SMT GMBH	75	2011–2021
ZEISS CARL SMT AG	33	2003–2010
GRUNER TORALFself	32	2012–2018
FELDMANN HEIKO	8	2012–2017
TOTZECK MICHAEL	7	2012–2014

Locations

Location	Patents	Span
Aalen, DE	105	2006–2021
Chemnitz, DE	3	2004–2006
KÃ¶nigsbronn, DE	2	2005–2006
Koenigsbronn, DE	2	2004–2005
Oberkochen, DE	1	2003