Inventor

Alfred T. Jeffries, III

Inventor

Providence, RI, US

Overview

25→

Patents

1986–2000

Patent span

Chemistry

Primary field (CPC C)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%

C07CAcyclic or carbocyclic compounds25%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds18%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%

C07DHeterocyclic compounds4%

C08LCompositions of macromolecular compounds4%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%

PatentTitleYear

6,140,026'Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures'2000 6,040,107'Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures'2000 5,366,843'Coated substrate utilizing composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone as sensitivity enhancers'1994 5,346,799'Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde'1994 5,346,808'Positive image formation utilizing o-quinonediazide composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone'1994 5,312,720'Process of developing a positive image utilizing o-naphthoquinone diazide radiation-sensitive esters of phenolic derivatives of 4-(4-hydroxyphenyl)cyclohexanone'1994 5,302,688'Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions'1994 5,283,374'Selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone and their use as sensitivity enhancers for radiation sensitive mixtures'1994 5,278,021'O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles'1994 5,235,022'Selected block copolymer novolak binder resins'1993 5,234,795'Process of developing an image-wise exposed resist-coated substrate'1993 5,232,819'Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions'1993 5,219,714'Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures'1993 5,220,073'Selected trihydroxybenzophenone compounds'1993 5,196,289'Selected block phenolic oligomers and their use in radiation-sensitive resist compositions'1993 5,196,517'Selected trihydroxybenzophenone compounds and their use as photoactive compounds'1993 5,188,921'Selected block copolymer novolak binder resins in radiation-sensitive resist compositions'1993 5,024,921'Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image'1991 4,992,596'Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures'1991 4,992,356'Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group'1991 4,970,287'Thermally stable phenolic resin compositions with ortho, ortho methylene linkage'1990 4,957,846'Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group'1990 4,837,121'Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin'1989 4,797,345'Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures'1989 4,617,252'Antireflective coatings for use in the manufacture of semi-conductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1986Patents assigned to HUNT CHEM CORP PHILIP A (1)· patent assignee history

1986–2000Based in Providence, RI, US· patent location history

1989–1991Patents assigned to OLIN HUNT SPECIALTY PROD (6)· patent assignee history

1991–1994Patents assigned to OCG MICROELECTRONIC MATERIALS (16)· patent assignee history

2000Patents assigned to ARCH SPEC CHEM INC (1)· patent assignee history

2000Patents assigned to OLIN MICROELECTRONIC CHEM INC (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
OCG MICROELECTRONIC MATERIALS	16	1991–1994
OLIN HUNT SPECIALTY PROD	6	1989–1991
ARCH SPEC CHEM INC	1	2000
HUNT CHEM CORP PHILIP A	1	1986
OLIN MICROELECTRONIC CHEM INC	1	2000

Locations

Location	Patents	Span
Providence, RI, US	25	1986–2000