LexDanaLexDanabeta
Inventor

Nobuaki Matsuoka

Inventor
Koshi, JP

Overview

56→
Patents
2003–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 56 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1035%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
G11CStatic stores8%
H01LSemiconductor devices6%
H10DInorganic electric semiconductor devices4%
B05CApparatus for applying fluent materials to surfaces, in general3%
B05BSpraying apparatus2%
B08BCleaning in general2%
F27BFurnaces, kilns, ovens or retorts in general2%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%
PatentTitleYear
10,807,027Treatment solution supply apparatus and substrate treatment system202010,767,200Method for producing L-amino acid20209,460,947'Coating and developing apparatus and method, and storage medium'20169,417,529'Coating and developing apparatus and method'20168,985,880'Coating and developing apparatus and method'20158,888,387'Coating and developing apparatus and method'20148,863,373'Apparatus and method of application and development'20148,817,225'Coating and developing apparatus and method, and storage medium'20148,740,481'Coating and developing apparatus'20148,568,043'Coating and developing apparatus and coating and developing method'20138,534,936'Coating and developing apparatus'20138,506,186'Coating and developing apparatus, coating and developing method and non-transitory tangible medium'20138,480,319'Coating and developing apparatus, coating and developing method and non-transitory tangible medium'20138,419,299'Coating and developing apparatus and method, and storage medium'20138,408,158'Coating/developing device and method'20138,342,761'Coating/developing apparatus and coating/developing method'20138,313,257'Coating and developing apparatus, substrate processing method, and storage medium'20128,302,556'Coating and developing apparatus'20128,268,384'Substrate processing apparatus and substrate processing method'20128,038,769'Liquid processing apparatus, liquid processing method and storage medium'20118,025,925'Heating apparatus, coating and development apparatus, and heating method'20117,997,813'Coating and developing system with a direct carrying device in a processing block, coating and developing method and storage medium'20117,955,011'Coating and developing apparatus, substrate processing method, and storage medium'20117,952,627'Solid-state image capturing apparatus and electric information device'20117,914,613'Liquid processing apparatus, liquid processing method and storage medium'20117,871,211'Coating and developing system, coating and developing method and storage medium'20117,841,072'Apparatus and method of application and development'20107,828,488'Developing apparatus, developing method, coating and developing system and storage medium'20107,819,080'Substrate processing apparatus and substrate processing method'20107,793,609'Coating and developing apparatus'20107,789,577'Coating and developing system, coating and developing method and storage medium'20107,736,498'Solution treatment apparatus and solution treatment method'20107,661,894'Coating and developing apparatus, and coating and developing method'20107,640,885'Liquid processing method and liquid processing apparatus'20107,591,601'Coater/developer, coating/developing method, and storage medium'20097,547,614'Solution treatment apparatus and solution treatment method'20097,527,497'Heat treating apparatus, heat treating method, and storage medium'20097,474,377'Coating and developing system'20097,403,260'Coating and developing system'20087,322,756'Coating and developing apparatus and coating and developing method'20087,287,920'Semiconductor manufacturing apparatus and method'20077,281,869'Coating and developing system and coating and developing method'20077,267,497'Coating and developing system and coating and developing method'20077,245,348'Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning'20077,241,061'Coating and developing system and coating and developing method'20077,224,618'Nonvolatile semiconductor memory device with erase voltage measurement'20077,139,202'Semiconductor storage device, mobile electronic apparatus, and method for controlling the semiconductor storage device'20067,072,236'Semiconductor memory device with pre-sense circuits and a differential sense amplifier'20067,050,331'Semiconductor memory device and portable electronic apparatus'20067,006,371'Semiconductor memory device and method for programming and erasing a memory cell'20066,992,930'Semiconductor memory device, method for driving the same and portable electronic apparatus'20066,985,376'Nonvolatile semiconductor storage apparatus having reduced variance in resistance values of each of the storage states'20066,982,906'Electrically programmable and electrically erasable semiconductor memory device'20066,894,929'Method of programming semiconductor memory device having memory cells and method of erasing the same'20056,831,872'Semiconductor memory device and method for correcting a reference cell'20046,559,710'Raised voltage generation circuit'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2011Patents assigned to SHARP KK (12)· patent assignee history
2003–2006Based in Tenri, JP· patent location history
2007–2020Patents assigned to TOKYO ELECTRON LTD (43)· patent assignee history
2007–2010Based in Suwa, JP· patent location history
2008–2013Based in Kumamoto, JP· patent location history
2009–2020Based in Koshi, JP· patent location history
2012–2015Patents assigned to MATSUOKA NOBUAKI (14)· patent assignee history
2012–2015Patents assigned to HAYASHI SHINICHI (11)· patent assignee history
2012–2015Patents assigned to MIYATA AKIRA (8)· patent assignee history
2020Based in Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD432007–2020
MATSUOKA NOBUAKIself142012–2015
SHARP KK122003–2011
HAYASHI SHINICHI112012–2015
MIYATA AKIRA82012–2015
Locations
LocationPatentsSpan
Koshi, JP292009–2020
Tenri, JP102003–2006
Suwa, JP82007–2010
Kumamoto, JP52008–2013
Kanagawa, JP12020