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Inventor

Daishi Tanak

Inventor
Kounosu, JP

Overview

1→
Patents
2013
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
8,400,610'Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013Patents assigned to COON DEREK (1)· patent assignee history
2013Patents assigned to KESWANI GAURAV (1)· patent assignee history
2013Patents assigned to KHO LEONARD (1)· patent assignee history
2013Patents assigned to NIKON CORP (1)· patent assignee history
2013Patents assigned to POON ALEX (1)· patent assignee history
2013Based in Kounosu, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
COON DEREK12013
KESWANI GAURAV12013
KHO LEONARD12013
NIKON CORP12013
POON ALEX12013
Locations
LocationPatentsSpan
Kounosu, JP12013