LexDanaLexDanabeta
Inventor

KI WOOK HWANG

Inventor
KR

Overview

2→
Patents
2022–2023
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Kprimary
C09KMaterials for miscellaneous applications, not provided for elsewhere29%
H01LSemiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
C09GPolishing compositions14%
PatentTitleYear
11,608,471Composition for etching silicon nitride film and etching method using same202311,254,871Etching composition for silicon nitride layer and method of etching silicon nitride layer using the same2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2023Patents assigned to SAMSUNG SDI CO LTD (2)· patent assignee history
2022–2023Based in KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG SDI CO LTD22022–2023
Locations
LocationPatentsSpan
KR22022–2023