Inventor
Joon Seok Oh
Inventor
Gyeonggi-do, KR
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%
H10DInorganic electric semiconductor devices14%
H04LTransmission of digital information, e.g. telegraphic communication11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
G06FElectric digital data processing7%
H03MCoding7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
H01LSemiconductor devices5%
Y02PClimate change mitigation technologies in the production or processing of goods5%
Y10TTechnical subjects covered by former us classification5%
PatentTitleYear
10,724,115Magnetite-based sintered ore and method of producing same202010,559,540Fan-out semiconductor package202010,237,018Communication device and communication method201910,142,058Communication device and communication method201810,044,469Communication device and communication method201810,026,681Fan-out semiconductor package20189,360,862'PLC network extension system'20169,306,767'Expandable Ethernet ring topology network and communication method thereof'20168,298,744'Coating material for photoresist pattern and method of forming fine pattern using the same'20128,278,218'Electrical conductor line having a multilayer diffusion barrier for use in a semiconductor device and method for forming the same'20128,080,472'Metal line having a MoxSiy/Mo diffusion barrier of semiconductor device and method for forming the same'20118,008,708'Metal line of semiconductor device having a diffusion barrier and method for forming the same'20117,989,582'Process for producing poly-tetrahydrofuran'20117,981,781'Metal line of semiconductor device having a diffusion barrier and method for forming the same'20117,875,978'Metal line having a multi-layered diffusion layer in a semiconductor device and method for forming the same'20117,777,336'Metal line of semiconductor device and method for forming the same'20107,625,695'Polymers for anti-reflective coatings, anti-reflective coating compositions and methods of forming a pattern using the same'20097,501,224'Compositions for use in forming a pattern and methods of forming a pattern'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (4)· patent assignee history
2009–2020Based in Seoul, KR· patent location history
2010–2012Patents assigned to HYNIX SEMICONDUCTOR INC (6)· patent assignee history
2010–2012Based in Gyeonggi-do, KR· patent location history
2011–2016Patents assigned to OH JOON SEOK (3)· patent assignee history
2011–2012Patents assigned to JUNG DONG HA (2)· patent assignee history
2016–2019Patents assigned to LSIS CO LTD (5)· patent assignee history
2016–2019Based in Gunpo-si, KR· patent location history
2018–2020Based in Suwon-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HYNIX SEMICONDUCTOR INC | 6 | 2010–2012 |
| LSIS CO LTD | 5 | 2016–2019 |
| SAMSUNG ELECTRONICS CO LTD | 4 | 2009–2020 |
| OH JOON SEOKself | 3 | 2011–2016 |
| JUNG DONG HA | 2 | 2011–2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Gyeonggi-do, KR | 6 | 2010–2012 |
| Seoul, KR | 5 | 2009–2020 |
| Gunpo-si, KR | 5 | 2016–2019 |
| Suwon-si, KR | 2 | 2018–2020 |