Inventor
Mauricio Manfrini
Inventor
TW
Overview
Patents· 121 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Bprimary
H10BElectronic memory devices24%
H10DInorganic electric semiconductor devices22%
H01LSemiconductor devices19%
H10NElectric solid-state devices not otherwise provided for11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
G11CStatic stores7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
B82YSpecific uses or applications of nanostructures1%
C23CCoating metallic material0%
G06NComputing arrangements based on specific computational models0%
PatentTitleYear
12,568,771Memory cell with magnetic access selector apparatus202612,563,742Multi-gate selector switches for memory cells and methods of forming the same202612,563,737Memory device fabrication through wafer bonding202612,557,342Transistor, integrated circuit, and manufacturing method of transistor202612,557,293Ferroelectric memory device using back-end-of-line (BEOL) thin film access transistors and methods for forming the same202612,538,522Access transistor including a metal oxide barrier layer and methods for forming the same202612,507,419Memory cell device with thin-film transistor selector and methods for forming the same202512,471,299Ferroelectric tunnel junction devices with a sparse seed layer and methods for forming the same202512,464,730Method of forming capacitors through wafer bonding202512,456,676Semiconductor device including first and second transistor channels202512,457,753Back-end-of-line selector for memory device202512,453,076High-density 3D-DRAM cell with scaled capacitors202512,446,231Method of integrating a capacitor including a non-linear polar material with a transistor through wafer bonding202512,439,606Gate coupled non-linear polar material based capacitors for memory and logic202512,402,355Access transistor including a metal oxide barrier layer and methods for forming the same202512,396,211Thin film transistor, semiconductor device and method of fabricating thin film transistor202512,396,371Three-state memory device202512,376,312Methods of fabricating planar capacitors on a shared plate electrode202512,369,326Capacitor devices with shared electrode and methods of fabrication202512,349,363Ferroelectric device and methods of forming the same202512,349,603Transistor, semiconductor device including the same, and manufacturing method thereof202512,349,365Drain coupled non-linear polar material based capacitors for memory and logic202512,349,368Memory device including a semiconducting metal oxide fin transistor and methods of forming the same202512,349,361Ferroelectric memory device and method of forming the same202512,336,184Methods of fabricating trench capacitors on a shared plate electrode202512,328,878Integration of 2T-202512,324,163Planar capacitors with shared electrode and methods of fabrication202512,324,360Semiconductor structure and method of forming the same202512,302,590Ferroelectric MFM capacitor array and methods of making the same202512,289,892Memory device structure and manufacturing method thereof202512,274,071Capacitor integrated with a transistor for logic and memory applications202512,262,541Trench capacitors with shared electrode202512,255,236Self-aligned active regions and passivation layer and methods of making the same202512,232,328Memory devices202512,230,716Semiconductor structure with thin film transistor202512,219,780High-density memory device with planar thin film transistor (TFT) selector and methods for making the same202512,219,779Spacer-defined back-end transistor as memory selector202512,219,778Multi-gate selector switches for memory cells and methods of forming the same202512,206,024Transistors including crystalline raised active regions and methods for forming the same202512,207,476Memory cell with unipolar selectors202512,191,389Layered structure, semiconductor device including the same, and manufacturing method thereof202512,183,825Thin film transistor including a hydrogen-blocking dielectric barrier and methods for forming the same202412,176,433Polarization enhancement structure for enlarging memory window202412,159,942Semiconductor device and method for manufacturing the same202412,154,938Ferroelectric MFM capacitor array and methods of making the same202412,148,828Semiconductor device and manufacturing method thereof202412,144,184Tunnel junction selector MRAM202412,137,621Intercalated metal/dielectric structure for nonvolatile memory devices202412,137,617Memory cell with magnetic access selector apparatus202412,125,920Dual-layer channel transistor and methods of forming same202412,125,921Semiconducting metal oxide transistors having a patterned gate and methods for forming the same202412,120,885Ferroelectric tunnel junction memory device using a magnesium oxide tunneling dielectric and methods for forming the same202412,094,923Rapid thermal annealing (RTA) methodologies for integration of perovskite-material based memory devices202412,080,768Transistor, semiconductor structure, and manufacturing method thereof202412,075,710Three-state memory device202412,075,633Vertical metal oxide semiconductor channel selector transistor and methods of forming the same202412,062,584Iterative method of multilayer stack development for device applications202412,063,870Transistor, semiconductor device including the same, and manufacturing method thereof202412,058,873Memory device including a semiconducting metal oxide fin transistor and methods of forming the same202412,057,471Ferroelectric tunnel junction devices with a sparse seed layer and methods for forming the same202412,051,702Crystalline semiconductor layer formed in BEOL processes202412,027,632Semiconductor structure with barrier and method for manufacturing the same202412,010,854Multi-level hydrogen barrier layers for memory applications and methods of fabrication202411,997,855Back-end-of-line selector for memory device202411,955,548Two-dimensional (2D) material for oxide semiconductor (OS) ferroelectric field-effect transistor (FeFET) device202411,955,549Layered structure, semiconductor device including the same, and manufacturing method thereof202411,949,020Transistor, integrated circuit, and manufacturing method202411,943,933Ferroelectric memory device using back-end-of-line (BEOL) thin film access transistors and methods for forming the same202411,942,147Semiconducting metal oxide memory device using hydrogen-mediated threshold voltage modulation and methods for forming the same202411,929,436Thin transistor including a hydrogen-blocking dielectric barrier and methods for forming the same202411,923,459Transistor including hydrogen diffusion barrier film and methods of forming same202411,916,144Semiconductor device and manufacturing method thereof202411,917,832Ferroelectric tunnel junction devices with metal-FE interface layer and methods for forming the same202411,908,704Method of fabricating a perovskite-material based planar capacitor using rapid thermal annealing (RTA) methodologies202411,894,417Method of fabricating a perovskite-material based trench capacitor using rapid thermal annealing (RTA) methodologies202411,871,584Multi-level hydrogen barrier layers for memory applications202411,869,843Integrated trench and via electrode for memory device applications and methods of fabrication202411,869,928Dual hydrogen barrier layer for memory devices202411,862,517Integrated trench and via electrode for memory device applications202411,855,226Thin film transistor, semiconductor device and method of fabricating thin film transistor202311,844,203Conductive and insulative hydrogen barrier layer for memory devices202311,844,225Dual hydrogen barrier layer for memory devices integrated with low density film for logic structures and methods of fabrication202311,839,070High density dual encapsulation materials for capacitors and methods of fabrication202311,839,088Integrated via and bridge electrodes for memory array applications and methods of fabrication202311,817,485Self-aligned active regions and passivation layer and methods of making the same202311,805,657Ferroelectric tunnel junction memory device using a magnesium oxide tunneling dielectric and methods for forming the same202311,791,420Semiconductor device and method for manufacturing the same202311,785,780Semiconductor device and method of fabricating the same202311,778,836Memory cell with unipolar selectors202311,769,790Rapid thermal annealing (RTA) methodologies for integration of perovskite-material based trench capacitors202311,765,908Memory device fabrication through wafer bonding202311,757,047Semiconducting metal oxide transistors having a patterned gate and methods for forming the same202311,756,987Ferroelectric tunnel junction devices with discontinuous seed structure and methods for forming the same202311,751,487Semiconductor device and method of forming the same202311,737,284Tunnel junction selector MRAM202311,737,288High-density memory device with planar thin film transistor (TFT) selector and methods for making the same202311,723,291Intercalated metal/dielectric structure for nonvolatile memory devices202311,705,516Polarization enhancement structure for enlarging memory window202311,699,655Transistor and fabrication method thereof202311,696,453Vertical metal oxide semiconductor channel selector transistor and methods of forming the same202311,647,636Memory devices202311,646,379Dual-layer channel transistor and methods of forming same202311,587,786Crystalline semiconductor layer formed in BEOL processes202311,586,885Synapse-inspired memory element for neuromorphic computing202311,581,335Ferroelectric tunnel junction devices with metal-FE interface layer and methods for forming the same202311,581,366Memory cell device with thin-film transistor selector and methods for forming the same202311,569,250Ferroelectric memory device using back-end-of-line (BEOL) thin film access transistors and methods for forming the same202311,569,294Semiconductor device and manufacturing method thereof202311,557,678Transistor, integrated circuit, and manufacturing method202311,527,552Ferroelectric memory device and method of forming the same202211,444,025Transistor and fabrication method thereof202211,430,512Semiconducting metal oxide memory device using hydrogen-mediated threshold voltage modulation and methods for forming the same202211,398,597Transistor, semiconductor device including the same, and manufacturing method thereof202211,380,840Memory cell with magnetic access selector apparatus202211,374,057Vertical metal oxide semiconductor channel selector transistor and methods of forming the same202211,355,496High-density 3D-dram cell with scaled capacitors202211,322,519Semiconductor device and method of fabricating the same202211,309,353Spacer-defined back-end transistor as memory selector202211,264,498Semiconductor device and method of fabricating the same202211,211,426Tunnel junction selector MRAM202111,177,267Semiconductor structure and manufacturing method thereof2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (94)· patent assignee history
2021–2026Based in TW· patent location history
2023–2026Patents assigned to KEPLER COMPUTING INC (27)· patent assignee history
2023–2026Based in BE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 94 | 2021–2026 |
| KEPLER COMPUTING INC | 27 | 2023–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 92 | 2021–2026 |
| BE | 29 | 2023–2026 |