Inventor
Kyung Soo Choi
Inventor
Hanam-si, KR
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein9%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
G02BOptical elements, systems or apparatus6%
G06FElectric digital data processing6%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations3%
C08LCompositions of macromolecular compounds3%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
PatentTitleYear
10,979,712Block-based video decoding method using pre-scan and apparatus thereof202110,578,967Resin composition, and display device comprising black bank manufactured by using same20209,972,982Apparatus for relieving tension of electric cable20189,733,563'Photosensitive resin composition and photosensitive material comprising the same'20179,470,975'Photosensitive resin composition and touch panel or display device including bezel pattern prepared by using same'20169,341,946'Photosensitive resin composition, pattern formed using same and display panel comprising same'20169,274,423'Fluorine-based resins and photosensitive resin composition comprising the same'20168,822,127'Photosensitive resin composition for black matrix'20148,822,132'Colored dispersion, photoresist composition and black matrix'20148,597,861'Method for manufacturing color filter and color filter manufactured by using the same'20138,535,874'Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same'20138,338,559'Fluorene-based resin polymer and method for preparing thereof'20128,137,873'Color filter and method for manufacturing thereof'20127,567,778'Apparatus and method for controlling switch of satellite transponder for multibeam communication'20097,172,996'Cleaning agent composition for a positive or a negative photoresist'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2009Based in Daejon, KR· patent location history
2012–2020Patents assigned to LG CHEMICAL LTD (11)· patent assignee history
2012–2014Patents assigned to CHOI KYUNG-SOO (4)· patent assignee history
2012–2016Based in Hanam-si, KR· patent location history
2013–2017Patents assigned to CHOI KYUNG SOO (4)· patent assignee history
2013–2017Patents assigned to CHA GEUN YOUNG (3)· patent assignee history
2013–2017Patents assigned to JI HO CHAN (3)· patent assignee history
2014–2018Based in Gyeonggi-do, KR· patent location history
2016–2020Based in Daejeon, KR· patent location history
2021Based in Seoul, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LG CHEMICAL LTD | 11 | 2012–2020 |
| CHOI KYUNG SOOself | 4 | 2013–2017 |
| CHOI KYUNG-SOOself | 4 | 2012–2014 |
| CHA GEUN YOUNG | 3 | 2013–2017 |
| JI HO CHAN | 3 | 2013–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hanam-si, KR | 5 | 2012–2016 |
| Daejeon, KR | 3 | 2016–2020 |
| Gyeonggi-do, KR | 2 | 2014–2018 |
| Daejon, KR | 2 | 2007–2009 |
| Seoul, KR | 1 | 2021 |