Inventor
Hiroshi Morioka
Inventor
Higashimurayama, JP
Overview
Patents· 39 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H01JElectric discharge tubes or discharge lamps15%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
G06TImage data processing or generation, in general9%
H10DInorganic electric semiconductor devices7%
G01RMeasuring electric variables6%
F16HGearing5%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
B82YSpecific uses or applications of nanostructures4%
PatentTitleYear
10,962,702Input device20219,287,168'Semiconductor device and process for producing the same'20169,224,043'Map generation apparatus, map generation method, moving method for moving body, and robot apparatus'20158,749,062'Semiconductor device and process for producing the same'20148,247,290'Semiconductor device and method of manufacturing thereof'20127,803,518'Method for manufacturing micro structure'20107,670,759'Micro pattern forming method and semiconductor device manufacturing method'20107,601,576'Method for fabricating semiconductor device'20097,550,394'Semiconductor device and fabrication process thereof'20097,501,686'Semiconductor device and method for manufacturing the same'20097,455,618'Fluid level regulating method and fluid temperature regulator for automatic transmission'20087,177,020'Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process'20077,116,816'Method of inspecting a pattern and an apparatus thereof and a method of processing a specimen'20066,979,610'Semiconductor device fabrication method'20056,919,564'Inspection method, apparatus and system for circuit pattern'20056,903,821'Inspection method, apparatus and system for circuit pattern'20056,894,773'Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process'20056,881,653'Method of manufacturing CMOS semiconductor device'20056,759,655'Inspection method, apparatus and system for circuit pattern'20046,703,850'Method of inspecting circuit pattern and inspecting instrument'20046,650,409'Semiconductor device producing method, system for carrying out the same and semiconductor work processing apparatus included in the same system'20036,583,634'Method of inspecting circuit pattern and inspecting instrument'20036,565,465'Continuously variable belt transmission'20036,558,463'Solution and method for forming a ferroelectric film'20036,514,175'Hydraulic control system for transmissions'20036,504,609'Inspection method, apparatus and system for circuit pattern'20036,493,082'Inspection method, apparatus and system for circuit pattern'20026,480,279'Inspection method, apparatus and system for circuit pattern'20026,476,913'Inspection method, apparatus and system for circuit pattern'20026,449,948'Hydraulic circuit cleaning apparatus and method'20026,443,871'Control apparatus and method of belt-type continuously variable transmission'20026,421,122'Inspection method, apparatus and system for circuit pattern'20026,405,115'Shift control system for continuously variable transmissions'20026,388,747'Inspection method, apparatus and system for circuit pattern'20025,463,459'Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process'19955,274,434'Method and apparatus for inspecting foreign particles on real time basis in semiconductor mass production line'19935,233,191'Method and apparatus of inspecting foreign matters during mass production start-up and mass production line in semiconductor production process'19935,118,239'Cubic parking apparatus'19924,936,730'Elevated garage'1990Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2006Patents assigned to HITACHI LTD (16)· patent assignee history
1993–2007Based in Ebina, JP· patent location history
1993–2015Based in Yokohama, JP· patent location history
2002–2008Patents assigned to TOYOTA MOTOR CO LTD (6)· patent assignee history
2002–2005Based in Higashimurayama, JP· patent location history
2002–2008Based in Toyota, JP· patent location history
2005–2016Based in Kawasaki, JP· patent location history
2009–2010Patents assigned to FUJITSU MICROELECTRONICS LTD (4)· patent assignee history
2010–2016Patents assigned to FUJITSU SEMICONDUCTOR LTD (4)· patent assignee history
2012–2015Patents assigned to MORIOKA HIROSHI (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 16 | 1993–2006 |
| TOYOTA MOTOR CO LTD | 6 | 2002–2008 |
| FUJITSU MICROELECTRONICS LTD | 4 | 2009–2010 |
| FUJITSU SEMICONDUCTOR LTD | 4 | 2010–2016 |
| MORIOKA HIROSHIself | 3 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Higashimurayama, JP | 11 | 2002–2005 |
| Kawasaki, JP | 9 | 2005–2016 |
| Toyota, JP | 6 | 2002–2008 |
| Ebina, JP | 5 | 1993–2007 |
| Yokohama, JP | 3 | 1993–2015 |