Inventor

Francissek Sitek

Inventor

Therwil, CH

Overview

1→

Patents

1991

Patent span

Chemistry

Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Fprimary

C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium25%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds25%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%

PatentTitleYear

5,034,307'Process for the photographic production of relief images using selected titanocenes'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991Patents assigned to CIBA GEIGY CORP (1)· patent assignee history

1991Based in Therwil, CH· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CIBA GEIGY CORP	1	1991

Locations

Location	Patents	Span
Therwil, CH	1	1991