Inventor
Kazuya Fukuhara
Inventor
Tokyo, JP
Overview
Patents· 56 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices52%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
B82YSpecific uses or applications of nanostructures5%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G06FElectric digital data processing3%
H01LSemiconductor devices3%
B29CShaping or joining of plastics2%
G02BOptical elements, systems or apparatus2%
PatentTitleYear
10,022,748Stencil mask, stencil mask manufacturing method, and imprinting method20189,941,177Pattern accuracy detecting apparatus and processing system20189,885,960'Pattern shape adjustment method, pattern shape adjustment system, exposure apparatus, and recording medium'20189,817,318'Mask manufacturing equipment and mask manufacturing method'20179,541,847'Imprint method and imprint system'20179,040,358'Semiconductor device and method for manufacturing the same'20158,846,455'Semiconductor device and method for manufacturing the same'20148,778,572'Photomask and pattern forming method'20148,772,179'Pattern forming method, pattern forming apparatus, and method for manufacturing semiconductor device'20148,679,731'Semiconductor device manufacturing method'20148,584,054'Photomask manufacturing method and semiconductor device manufacturing method'20138,440,376'Exposure determining method, method of manufacturing semiconductor device, and computer program product'20138,419,950'Pattern forming method'20138,407,628'Photomask manufacturing method and semiconductor device manufacturing method'20138,384,229'Semiconductor device and method for manufacturing the same'20138,373,258'Semiconductor device and production method thereof'20138,343,692'Exposure apparatus inspection mask and exposure apparatus inspection method'20138,294,889'Method for inspecting nano-imprint template'20128,293,456'Semiconductor device manufacturing method'20128,142,960'Exposure method, mask data producing method, and semiconductor device manufacturing method'20128,122,385'Mask pattern correcting method'20128,097,942'Semiconductor device including power supply bar having jutted portion, parallel running portion and bent portion and manufacturing method therefor'20128,085,393'Exposure apparatus inspection method and method for manufacturing semiconductor device'20118,077,292'Projection exposure method'20118,072,601'Pattern monitor mark and monitoring method suitable for micropattern'20117,960,075'Photomask unit, exposing method and method for manufacturing semiconductor device'20117,925,090'Method of determining photo mask, method of manufacturing semiconductor device, and computer program product'20117,904,851'Photomask manufacturing method and semiconductor device manufacturing method'20117,807,323'Exposure condition setting method, semiconductor device manufacturing method, and exposure condition setting program'20107,803,502'Photomask and method of manufacturing semiconductor device using the photomask'20107,740,994'Method for selecting photomask substrate, method for manufacturing photomask, and method for manufacturing semiconductor device'20107,716,628'System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects'20107,691,542'Exposure system, test mask for flare testing, method for evaluating lithography process, method for evaluating exposure tools, method for generating corrected mask pattern, and method for manufacturing semiconductor device'20107,692,769'Exposure apparatus, exposure method, and semiconductor device manufacturing method'20107,685,556'Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method'20107,676,078'Inspection method, processor and method for manufacturing a semiconductor device'20107,652,747'Immersion exposure method and immersion exposure apparatus which transfer image of pattern formed on mask onto substrate through immersion medium'20107,586,605'Method for testing a polarization state, method for manufacturing a semiconductor device, and test substrate for testing a polarization state'20097,556,896'Inspection method and photomask'20097,537,869'Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process'20097,537,871'Method of manufacturing semiconductor device'20097,517,621'Exposure method and method for manufacturing semiconductor device'20097,446,853'Exposure method, exposure tool and method of manufacturing a semiconductor device'20087,440,104'Exposure system, test mask for monitoring polarization, and method for monitoring polarization'20087,436,491'Exposure system, exposure method and method for manufacturing a semiconductor device'20087,386,830'Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product'20087,327,449'Exposure apparatus inspection method and exposure apparatus'20087,327,436'Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product'20087,286,216'Exposure apparatus inspection method and exposure apparatus'20077,186,485'Inspection method and a photomask'20077,148,138'Method of forming contact hole and method of manufacturing semiconductor device'20067,139,998'Photomask designing method, pattern predicting method and computer program product'20067,072,040'Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus'20067,030,445'Power MOSFET, power MOSFET packaged device, and method of manufacturing power MOSFET'20066,930,757'Managing method of exposure apparatus, managing method of mask, exposure method, and manufacturing method of semiconductor device'20056,839,132'Aberration measuring method of projection optical system'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2017Patents assigned to TOSHIBA KK (45)· patent assignee history
2005–2018Based in Tokyo, JP· patent location history
2011–2017Patents assigned to FUKUHARA KAZUYA (18)· patent assignee history
2012–2015Patents assigned to RENESAS ELECTRONICS CORP (5)· patent assignee history
2012–2014Patents assigned to HASHIMOTO TAKAKI (2)· patent assignee history
2013–2015Based in Kanagawa, JP· patent location history
2017–2018Patents assigned to TOSHIBA MEMORY CORP (4)· patent assignee history
2017–2018Based in Suginami-ku, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 45 | 2005–2017 |
| FUKUHARA KAZUYAself | 18 | 2011–2017 |
| RENESAS ELECTRONICS CORP | 5 | 2012–2015 |
| TOSHIBA MEMORY CORP | 4 | 2017–2018 |
| HASHIMOTO TAKAKI | 2 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 49 | 2005–2018 |
| Kanagawa, JP | 4 | 2013–2015 |
| Suginami-ku, JP | 3 | 2017–2018 |