Inventor
Qiang Fang
Inventor
Ballston Lake, NY, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices26%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1024%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
G06FElectric digital data processing4%
H04LTransmission of digital information, e.g. telegraphic communication4%
H10DInorganic electric semiconductor devices4%
C07CAcyclic or carbocyclic compounds2%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
C25DProcesses for the electrolytic or electrophoretic production of coatings2%
PatentTitleYear
10,770,344Chamferless interconnect vias of semiconductor devices202010,719,602Method and device for realizing session identifier synchronization202010,446,395Self-aligned multiple patterning processes with layered mandrels201910,375,064Method, apparatus, and system for remotely accessing cloud applications201910,340,183Cobalt plated via integration scheme201910,262,942Method of forming cobalt contact module and cobalt contact module formed thereby201910,109,521Method to prevent cobalt recess201810,044,162High energy nanosecond pulsed fiber laser based on incoherent beam combination20189,966,881Bluetooth motor controller, brushless direct current motor, and multi-motor system comprising the same20189,865,543'Structure and method for inhibiting cobalt diffusion'20189,768,058'Methods of forming air gaps in metallization layers on integrated circuit products'20179,741,610'Sacrificial amorphous silicon hard mask for BEOL'20179,711,447'Self-aligned lithographic patterning with variable spacings'20179,595,493'Reducing liner corrosion during metallization of semiconductor devices'20179,518,151'Low dielectric constant polymer containing dinaphthyl and hexafluorocyclobutyl ether unit, preparation method and use'20169,466,723'Liner and cap layer for placeholder source/drain contact structure planarization and replacement'20168,170,055'Method of converting between radius message and diameter messages'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2019Patents assigned to FANG QIANG (2)· patent assignee history
2012Patents assigned to ALCATEL LUCENT (1)· patent assignee history
2016–2020Patents assigned to GLOBALFOUNDRIES INC (11)· patent assignee history
2016–2020Based in Ballston Lake, NY, US· patent location history
2016Based in Shanghai, CN· patent location history
2018Based in Weihai, CN· patent location history
2018Based in Zhongshan, CN· patent location history
2019–2020Patents assigned to ALIBABA GROUP HOLDING LTD (2)· patent assignee history
2019Patents assigned to AN QING (1)· patent assignee history
2019–2020Based in Hangzhou, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| GLOBALFOUNDRIES INC | 11 | 2016–2020 |
| ALIBABA GROUP HOLDING LTD | 2 | 2019–2020 |
| FANG QIANGself | 2 | 2012–2019 |
| ALCATEL LUCENT | 1 | 2012 |
| AN QING | 1 | 2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ballston Lake, New York, US | 11 | 2016–2020 |
| Hangzhou, CN | 2 | 2019–2020 |
| Weihai, CN | 1 | 2018 |
| Zhongshan, CN | 1 | 2018 |
| Shanghai, CN | 1 | 2016 |