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Inventor

Tsutomu Doi

Inventor
Yokohama, JP

Overview

2→
Patents
2001–2002
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests33%
B08BCleaning in general17%
F26BDrying solid materials or objects by removing liquid therefrom17%
PatentTitleYear
6,374,834'Substrate processing method and processing apparatus'20026,192,903'Spin-processing apparatus and spin-processing method'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Patents assigned to SHIBAURA MECHATRONICS CORP (1)· patent assignee history
2001Patents assigned to TOSHIBA KK (1)· patent assignee history
2001–2002Based in Yokohama, JP· patent location history
2002Patents assigned to SHIBAURA MECHATRONICS CORP OF (1)· patent assignee history
2002Patents assigned to SHINETSU HANDOTAI KK (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHIBAURA MECHATRONICS CORP12001
SHIBAURA MECHATRONICS CORP OF12002
SHINETSU HANDOTAI KK12002
TOSHIBA KK12001
Locations
LocationPatentsSpan
Yokohama, JP22001–2002