Inventor
Joo Won Han
Inventor
Santa Clara, CA, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H01JElectric discharge tubes or discharge lamps14%
B08BCleaning in general7%
C11DDetergent compositions7%
C23CCoating metallic material7%
H10BElectronic memory devices7%
H10DInorganic electric semiconductor devices7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
PatentTitleYear
10,265,742Method for in-situ chamber clean using carbon monoxide (CO) gas utlized in an etch processing chamber20199,236,255'Methods for forming three dimensional NAND structures atop a substrate'20168,937,021'Methods for forming three dimensional NAND structures atop a substrate'20158,932,947'Methods for forming a round bottom silicon trench recess for semiconductor applications'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2019Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
2015Patents assigned to CHO HAN SOO (1)· patent assignee history
2015Patents assigned to CHO KEE YOUNG (1)· patent assignee history
2015Patents assigned to HAN JOO WON (1)· patent assignee history
2015Patents assigned to KHAN ANISUL H (1)· patent assignee history
2015–2019Based in Santa Clara, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 4 | 2015–2019 |
| CHO HAN SOO | 1 | 2015 |
| CHO KEE YOUNG | 1 | 2015 |
| HAN JOO WONself | 1 | 2015 |
| KHAN ANISUL H | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Santa Clara, California, US | 4 | 2015–2019 |