Inventor
Nobuhiko Ikenoya
Inventor
Chiyoda-ku, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
10,948,814Substrate for use as mask blank, and mask blank202110,146,126Glass substrate for mask blank, mask blank, photomask, and method for manufacturing glass substrate for mask blank201810,146,125Glass substrate for mask blank, mask blank, photomask, and method for manufacturing glass substrate for mask blank2018Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2018–2021Patents assigned to AGC INC (3)· patent assignee history
2018Patents assigned to ASAHI GLASS CO LTD (2)· patent assignee history
2018Based in Chiyoda-ku, JP· patent location history
2021Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGC INC | 3 | 2018–2021 |
| ASAHI GLASS CO LTD | 2 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chiyoda-ku, JP | 2 | 2018 |
| Tokyo, JP | 1 | 2021 |