Inventor
Hongzhou Liu
Inventor
Sewickley, PA, US
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G06Fprimary
G06FElectric digital data processing71%
Y02PClimate change mitigation technologies in the production or processing of goods10%
G01RMeasuring electric variables3%
G06TImage data processing or generation, in general3%
H03MCoding3%
H04LTransmission of digital information, e.g. telegraphic communication3%
H04MTelephonic communication3%
H04WWireless communication networks3%
PatentTitleYear
11,026,130Method, apparatus, and system for handover to circuit switched domain202110,853,550Sampling selection for enhanced high yield estimation in circuit designs202010,776,548Parallel Monte Carlo sampling for predicting tail performance of integrated circuits202010,528,644Estimation and visualization of a full probability distribution for circuit performance obtained with Monte Carlo simulations over scaled sigma sampling202010,325,056Failure boundary classification and corner creation for scaled-sigma sampling201910,289,764Parallel extraction of worst case corners201910,275,555Yield estimation for a post-layout circuit design201910,262,092Interactive platform to predict mismatch variation and contribution when adjusting component parameters201910,114,916Method and system to accelerate visualization of waveform data201810,084,476Adaptive lossless compression in analog mixed signal environments20189,836,564Efficient extraction of the worst sample in Monte Carlo simulation20179,805,158'Efficient extraction of K-sigma corners from Monte Carlo simulation'20179,524,365'Efficient monte carlo flow via failure probability modeling'20168,954,910'Device mismatch contribution computation with nonlinear effects'20158,954,908'Fast monte carlo statistical analysis using threshold voltage modeling'20158,813,009'Computing device mismatch variation contributions'20148,589,852'Statistical corner extraction using worst-case distance'20138,479,126'Parametric yield improvement flow incorporating sigma to target distance'20138,219,355'Methods and systems for high sigma yield estimation'20128,195,427'Methods and systems for high sigma yield estimation using reduced dimensionality'20127,712,055'Designing integrated circuits for yield'20107,533,358'Integrated sizing, layout, and extractor tool for circuit design'20097,493,574'Method and system for improving yield of an integrated circuit'20097,346,868'Method and system for evaluating design costs of an integrated circuit'20086,957,400'Method and apparatus for quantifying tradeoffs for multiple competing goals in circuit design'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2020Patents assigned to CADENCE DESIGN SYSTEMS INC (23)· patent assignee history
2005–2013Based in Pittsburgh, PA, US· patent location history
2009Patents assigned to CADENCE DESIGNS SYSTEMS INC (1)· patent assignee history
2012–2013Patents assigned to LIU HONGZHOU (4)· patent assignee history
2012–2013Patents assigned to ZHANG HUI (4)· patent assignee history
2012Patents assigned to TIWARY SAURABH (2)· patent assignee history
2012–2020Based in Sewickley, PA, US· patent location history
2020Based in San Jose, CA, US· patent location history
2021Based in Shenzhen, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CADENCE DESIGN SYSTEMS INC | 23 | 2005–2020 |
| LIU HONGZHOUself | 4 | 2012–2013 |
| ZHANG HUI | 4 | 2012–2013 |
| TIWARY SAURABH | 2 | 2012 |
| CADENCE DESIGNS SYSTEMS INC | 1 | 2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sewickley, Pennsylvania, US | 17 | 2012–2020 |
| Pittsburgh, Pennsylvania, US | 6 | 2005–2013 |
| Shenzhen, CN | 1 | 2021 |
| San Jose, California, US | 1 | 2020 |