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Inventor

Kazushige Inoue

Inventor
Moka, JP

Overview

23→
Patents
1989–2010
Patent span
Chemistry
Primary field (CPC C)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds20%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients12%
G03GElectrography12%
C08LCompositions of macromolecular compounds10%
G11BInformation storage based on relative movement between record carrier and transducer10%
B41JTypewriters5%
Y10TTechnical subjects covered by former us classification5%
B29BPreparation or pretreatment of the material to be shaped2%
B29CShaping or joining of plastics2%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts2%
PatentTitleYear
7,794,075'Ultraviolet ray irradiation device, recording apparatus using the ultraviolet ray irradiation device, and recording method'20107,794,076'Ultraviolet ray irradiation device, recording apparatus using the ultraviolet ray irradiation device, and recording method'20107,790,245'Photo curable ink composition set, and recording method and recordings employing ink composition set'20107,514,523'Polycarbonate compositions and articles formed therefrom, with matte surfaces and high light transmissions'20096,797,803'Recycle process for polycondensation resins'20046,790,927'Optical polycarbonate and applications thereof'20046,720,404'Polycarbonates for optical use, and their applications'20046,482,877'Polycarbonate resin composition for optical use'20026,372,175'Resin pellets for injection molding'20026,303,735'Polycarbonate production method'20016,271,290'Polycarbonate resin composition for optical use'20016,262,218'Optical quality polycarbonates with reduced static charge and method for making same'20016,022,943'Optical quality polycarbonates with reduced static charge and method for making same'20005,804,347'Electrophotographic toner and contact development method using the toner'19985,672,644'Light resistant polyphenylene ether resin compositions'19975,648,192'Electrophotographic toner'19975,625,009'Antistatic polyphenylene ether resin composition'19975,614,348'Toner for non-magnetic one-component development and method for contact type development using the same'19975,371,134'Electrically conductive resin compositions'19945,273,853'Black photoconductive toner having sensitivity to light in the wavelength range of semiconductor lasers'19935,055,523'Aromatic polycarbonate resin composition'19915,045,879'Image forming apparatus using photosensitive toner'19914,876,204'Method and apparatus of automatic continuous analysis using analytical implement'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989Patents assigned to KYOTO DAIICHI KAGAKU KK (1)· patent assignee history
1991–1998Patents assigned to MITA INDUSTRIAL CO LTD (5)· patent assignee history
1991–1994Patents assigned to GE PLASTICS JAPAN LTD (2)· patent assignee history
1991–1993Based in Takatsuki, JP· patent location history
1994–2009Based in Moka, JP· patent location history
1997–2004Patents assigned to GEN ELECTRIC (11)· patent assignee history
1997–1998Based in Osaka, JP· patent location history
2010Patents assigned to SEIKO EPSON CORP (3)· patent assignee history
2010Based in Okayama, JP· patent location history
2010Based in Suwa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
GEN ELECTRIC111997–2004
MITA INDUSTRIAL CO LTD51991–1998
SEIKO EPSON CORP32010
GE PLASTICS JAPAN LTD21991–1994
KYOTO DAIICHI KAGAKU KK11989
Locations
LocationPatentsSpan
Moka, JP121994–2009
Osaka, JP31997–1998
Okayama, JP22010
Takatsuki, JP21991–1993
Suwa, JP12010