Inventor
TAKASHI TAIRA
Inventor
JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps25%
H01LSemiconductor devices19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling6%
C23CCoating metallic material6%
G01BMeasuring length, thickness or similar linear dimensions6%
G11CStatic stores6%
H02NElectric machines not otherwise provided for6%
H10BElectronic memory devices6%
PatentTitleYear
12,261,028Plasma processing apparatus202511,984,301Edge ring, substrate support, substrate processing apparatus and method202411,562,892Dielectric member, structure, and substrate processing apparatus202311,417,404Semiconductor storage device202211,264,267Apparatus for processing substrate and method for detecting a presence of a focus ring on a stage2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history
2022Patents assigned to KIOXIA CORP (1)· patent assignee history
2022–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 4 | 2022–2025 |
| KIOXIA CORP | 1 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 5 | 2022–2025 |