Inventor
Grant N. Pealer, III
Inventor
Jericho, VT, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1030%
Y10TTechnical subjects covered by former us classification30%
PatentTitleYear
8,634,063'Wafer with design printed outside active region and spaced by design tolerance of reticle blind'20147,656,505'Apparatus to easily measure reticle blind positioning with an exposure apparatus'20107,005,221'Method and apparatus to easily measure reticle blind positioning with an exposure apparatus'20065,973,771'Pupil imaging reticle for photo steppers'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2014Patents assigned to IBM (4)· patent assignee history
1999–2014Based in Jericho, VT, US· patent location history
2014Patents assigned to FROEBEL ROBERT T (1)· patent assignee history
2014Patents assigned to PEALER III GRANT N (1)· patent assignee history
2014Patents assigned to SONNTAG PAUL D (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 4 | 1999–2014 |
| FROEBEL ROBERT T | 1 | 2014 |
| PEALER III GRANT Nself | 1 | 2014 |
| SONNTAG PAUL D | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Jericho, VT, US | 4 | 1999–2014 |