Inventor
Krzysztof Nowak
Inventor
Oyama, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Sprimary
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light42%
H05GX-ray technique21%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
B82YSpecific uses or applications of nanostructures12%
B23KSoldering or unsoldering3%
G02BOptical elements, systems or apparatus3%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
PatentTitleYear
9,680,277'Slab amplifier, and laser apparatus and extreme ultraviolet light generation apparatus including slab amplifier'20179,570,884'Laser apparatus, extreme ultraviolet light generation system, method for controlling the laser apparatus, and method for generating the extreme ultraviolet light'20179,407,052'Amplifier, laser apparatus, and extreme ultraviolet light generation system'20169,318,864'Laser beam output control with optical shutter'20169,153,927'Regenerative amplifier, laser apparatus, and extreme ultraviolet light generation system'20159,099,836'Laser beam amplifier and laser apparatus using the same'20159,089,927'Laser pulse generation method and apparatus'20159,036,251'Slab amplification device, laser apparatus, and extreme ultraviolet light generation system'20158,804,778'Laser apparatus and extreme ultraviolet light source apparatus'20148,749,876'Regenerative amplifier, laser apparatus, and extreme ultraviolet light generation system'20148,559,099'Laser beam amplifier and laser apparatus using the same'20138,476,609'Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method for controlling saturable absorber used in extreme ultraviolet light source device'20138,093,571'Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device'20127,903,715'Slab type laser apparatus'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2017Patents assigned to GIGAPHOTON INC (13)· patent assignee history
2011–2013Based in Hiratsuka, JP· patent location history
2012–2017Patents assigned to NOWAK KRZYSZTOF (8)· patent assignee history
2012–2017Patents assigned to WAKABAYASHI OSAMU (8)· patent assignee history
2012–2014Patents assigned to MORIYA MASATO (4)· patent assignee history
2012–2014Patents assigned to ENDO AKIRA (3)· patent assignee history
2013–2017Based in Oyama, JP· patent location history
2016–2017Based in Tochigi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| GIGAPHOTON INC | 13 | 2011–2017 |
| NOWAK KRZYSZTOFself | 8 | 2012–2017 |
| WAKABAYASHI OSAMU | 8 | 2012–2017 |
| MORIYA MASATO | 4 | 2012–2014 |
| ENDO AKIRA | 3 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Oyama, JP | 9 | 2013–2017 |
| Hiratsuka, JP | 3 | 2011–2013 |
| Tochigi, JP | 2 | 2016–2017 |