Inventor
Toshiharu Miwa
Inventor
Yokohama, JP
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
G05BControl or regulating systems in general17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
G06FElectric digital data processing9%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy9%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution9%
C01BNon-metallic elements4%
G01RMeasuring electric variables4%
Y02PClimate change mitigation technologies in the production or processing of goods4%
Y02TClimate change mitigation technologies related to transportation4%
PatentTitleYear
11,101,492Electronic device with secondary battery202111,088,363Positive electrode active material for secondary battery, secondary battery, battery management unit, and electronic device20219,147,913'Diagnosis system and diagnosis method for lithium ion secondary battery'20158,676,553'Apparatus abnormality diagnosis method and system'20148,566,070'Apparatus abnormality monitoring method and system'20138,515,719'Apparatus anomaly monitoring method and system'20138,043,772'Manufacturing method and manufacturing system of semiconductor device'20117,289,859'Method for determining parameter of product design and its supporting system'20077,036,084'Industrial equipment and system'20066,801,827'Overlay inspection apparatus for semiconductor substrate and method thereof'20046,721,940'Exposure processing method and exposure system for the same'20046,697,698'Overlay inspection apparatus for semiconductor substrate and method thereof'20046,653,032'Exposure method'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2015Patents assigned to HITACHI LTD (9)· patent assignee history
2003–2004Based in Tokyo, JP· patent location history
2004–2015Based in Yokohama, JP· patent location history
2007Based in Kariya, JP· patent location history
2013–2015Patents assigned to MIWA TOSHIHARU (4)· patent assignee history
2013–2014Patents assigned to TAMAKI KENJI (3)· patent assignee history
2015Patents assigned to ISHIKAWA SEIJI (1)· patent assignee history
2015Patents assigned to MATSUMOTO CHIZU (1)· patent assignee history
2021Based in Yokohama-shi, Kanagawa, JP· patent location history
2021Based in Mie-gun, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 9 | 2003–2015 |
| MIWA TOSHIHARUself | 4 | 2013–2015 |
| TAMAKI KENJI | 3 | 2013–2014 |
| ISHIKAWA SEIJI | 1 | 2015 |
| MATSUMOTO CHIZU | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 7 | 2004–2015 |
| Tokyo, JP | 2 | 2003–2004 |
| Yokohama-shi, Kanagawa, JP | 1 | 2021 |
| Mie-gun, JP | 1 | 2021 |
| Kariya, JP | 1 | 2007 |