Inventor
Toshitaka Hiraga
Inventor
Kanagawa, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
C11DDetergent compositions13%
PatentTitleYear
7,718,590'Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric material'20107,399,365'Aqueous fluoride compositions for cleaning semiconductor devices'20087,341,827'Separation-material composition for photo-resist and manufacturing method of semiconductor device'20087,250,391'Cleaning composition for removing resists and method of manufacturing semiconductor device'20077,087,563'Resist stripping composition and method of producing semiconductor device using the same'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2008Patents assigned to EKC TECHNOLOGY K K (3)· patent assignee history
2006–2010Based in Kanagawa, JP· patent location history
2008–2010Patents assigned to EKC TECHNOLOGY INC (2)· patent assignee history
2008Patents assigned to SONY CORP (1)· patent assignee history
2008Based in Setagaya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EKC TECHNOLOGY K K | 3 | 2006–2008 |
| EKC TECHNOLOGY INC | 2 | 2008–2010 |
| SONY CORP | 1 | 2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 4 | 2006–2010 |
| Setagaya, JP | 1 | 2008 |