Inventor
Kohsuke Tsuchiya
Inventor
Kiyosu, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Gprimary
C09GPolishing compositions19%
H01LSemiconductor devices19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
C09KMaterials for miscellaneous applications, not provided for elsewhere17%
B24BMachines, devices, or processes for grinding or polishing14%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%
B08BCleaning in general1%
C01BNon-metallic elements1%
C08BPolysaccharides1%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds1%
PatentTitleYear
10,745,588Silicon wafer polishing composition202010,748,778Method for polishing silicon wafer and surface treatment composition202010,717,899Polishing composition, method for producing polishing composition and polishing composition preparation kit202010,351,732Polishing composition, method for producing polishing composition and polishing composition preparation kit201910,344,185Composition for polishing silicon wafers201910,273,383Polishing composition for silicon wafer and polishing method201910,227,518Polishing composition and method for producing same20199,944,838Polishing composition and method for producing same20189,685,341'Abrasive composition and method for producing semiconductor substrate'20179,650,544'Polishing composition, method for manufacturing polishing composition, and method for manufacturing polishing composition liquid concentrate'20179,579,769'Composition for polishing purposes, polishing method using same, and method for producing substrate'20179,566,685'Polishing composition and method for producing polished article'20179,505,950'Polishing composition and method for producing substrate'20169,206,336'Polishing composition, manufacturing process therefor, process for production of silicon substrate, and silicon substrate'20159,028,709'Surface treatment composition and surface treatment method using same'20158,974,691'Composition for polishing and composition for rinsing'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2020Patents assigned to FUJIMI INC (16)· patent assignee history
2015Patents assigned to TAKAHASHI SHUHEI (2)· patent assignee history
2015Patents assigned to TSUCHIYA KOHSUKE (2)· patent assignee history
2015Patents assigned to IMAO TOMOHIRO (1)· patent assignee history
2015Patents assigned to MORINAGA HITOSHI (1)· patent assignee history
2015–2020Based in Kiyosu, JP· patent location history
2019–2020Based in Aichi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIMI INC | 16 | 2015–2020 |
| TAKAHASHI SHUHEI | 2 | 2015 |
| TSUCHIYA KOHSUKEself | 2 | 2015 |
| IMAO TOMOHIRO | 1 | 2015 |
| MORINAGA HITOSHI | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kiyosu, JP | 13 | 2015–2020 |
| Aichi, JP | 3 | 2019–2020 |