Inventor
Hajime Ishikawa
Inventor
Tokyo, JP
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H04Jprimary
H04JMultiplex communication21%
H10DInorganic electric semiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
B29CShaping or joining of plastics10%
C22CAlloys7%
G06FElectric digital data processing7%
H04LTransmission of digital information, e.g. telegraphic communication7%
B23KSoldering or unsoldering3%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for3%
C21DModifying the physical structure of ferrous metals3%
PatentTitleYear
8,874,280'Information processing system, method for checking vehicle, and program for checking vehicle'20148,717,941'Communication method, mobile agent device, and home agent device'20148,641,836'Steel plate for line pipe excellent in strength and ductility and method of production of same'20148,375,334'Portable information terminal, display control device, display control method, and computer readable program therefor'20137,372,804'Multiplex communication system and method'20086,477,184'Time-division multiplexing transmission system'20026,219,357'Channel multiplex demultiplex method and channel multiplex demultiplex unit'20015,892,469'Time division multiplexing transmitter and decoding circuit used for said transmitter and method for time division multiplexing transmission'19995,817,275'Steel plate having excellent corrosion resistance and sulfide stress cracking resistance'19985,785,920'Extrusion molding apparatus and method of forming a parison'19985,757,800'Time division multiplexing transmitter and decoding circuit used for said transmitter and method for time division multiplexing transmission'19985,723,089'Line pipe metal arc welded with wire alloy'19985,610,911'Method and device for channel selection'19975,601,779'Method for manufacturing hollow resin products'19975,589,205'Apparatus for manufacturing hollow resin products'19965,101,249'Nonvolatile semiconductor memory device'19924,349,395'Method for producing MOS semiconductor device'19824,343,657'Process for producing a semiconductor device'19824,298,629'Method for forming a nitride insulating film on a silicon semiconductor substrate surface by direct nitridation'19814,270,136'MIS Device having a metal and insulating layer containing at least one cation-trapping element'1981Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1981–1992Patents assigned to FUJITSU LTD (5)· patent assignee history
1981–1992Based in Yokohama, JP· patent location history
1996–1998Patents assigned to TIGERS POLYMER (3)· patent assignee history
1996–1998Based in Toyonaka, JP· patent location history
1997–2014Patents assigned to NEC CORP (7)· patent assignee history
1997–2014Based in Tokyo, JP· patent location history
1998Patents assigned to NIPPON STEEL CORP (2)· patent assignee history
1998Based in Kimitsu, JP· patent location history
2013–2014Patents assigned to ISHIKAWA HAJIME (4)· patent assignee history
2014Based in Funabashi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NEC CORP | 7 | 1997–2014 |
| FUJITSU LTD | 5 | 1981–1992 |
| ISHIKAWA HAJIMEself | 4 | 2013–2014 |
| TIGERS POLYMER | 3 | 1996–1998 |
| NIPPON STEEL CORP | 2 | 1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 8 | 1997–2014 |
| Yokohama, JP | 5 | 1981–1992 |
| Toyonaka, JP | 3 | 1996–1998 |
| Kimitsu, JP | 2 | 1998 |
| Funabashi, JP | 1 | 2014 |