Inventor
Toshiaki Hirota
Inventor
Ibara, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices42%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H01LSemiconductor devices17%
B23KSoldering or unsoldering8%
C09JAdhesives8%
PatentTitleYear
10,895,805Pellicle manufacturing method and method for manufacturing photomask with pellicle202110,585,348Pellicle, pellicle production method and exposure method using pellicle202010,488,751Pellicle, production method thereof, exposure method201910,216,081Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device201910,185,217Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device20199,841,670'Support frame for pellicles'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017Patents assigned to NIPPON LIGHT METAL CO (1)· patent assignee history
2017Based in Okayama, JP· patent location history
2019–2021Patents assigned to MITSUI CHEMICALS INC (4)· patent assignee history
2019–2021Based in Ibara, JP· patent location history
2021Patents assigned to TAZMO CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUI CHEMICALS INC | 4 | 2019–2021 |
| NIPPON LIGHT METAL CO | 1 | 2017 |
| TAZMO CO LTD | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ibara, JP | 5 | 2019–2021 |
| Okayama, JP | 1 | 2017 |