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Inventor

Hitoshi Onishi

Inventor
Niigata, JP

Overview

21→
Patents
1998–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Lprimary
C08LCompositions of macromolecular compounds12%
H01PWaveguides10%
B29CShaping or joining of plastics5%
C07CAcyclic or carbocyclic compounds5%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%
B29LIndexing scheme associated with subclass b29c, relating to particular articles3%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%
G02BOptical elements, systems or apparatus3%
H01LSemiconductor devices3%
PatentTitleYear
11,016,373Heat receiver having an annular flow path and manufacturing method of the same202110,637,053Production method of negative electrode active material for nonaqueous electrolyte secondary battery, production method of nonaqueous electrolyte secondary battery, production method of negative electrode for nonaqueous electrolyte secondary battery, and nonaqueous electrolyte secondary battery202010,297,817Negative electrode for lithium ion secondary cell, lithium-ion secondary cell, mixture paste for negative electrode for lithium-ion secondary cell, and method for manufacturing negative electrode for lithium-ion secondary cell20199,314,963'Imprint product and method for producing the same'20169,309,402'Biodegradable resin composition and molded article of the same'20169,221,949'Resin, optical material, and optical device'20159,184,372'Piezoelectric polymer material and method for producing same'20158,829,121'Piezoelectric polymer material and method for producing same'20147,939,991'Piezoelectric gas ejecting device'20117,431,574'Pump actuated by diaphragm'20086,989,719'Non-reciprocal circuit element with reduced shift of center frequency of insertion loss with change in temperature and communication device'20066,987,426'Nonreciprocal circuit element with input and output characteristic impedances matched'20066,943,642'Nonreciprocal circuit element and method of manufacturing the same'20056,876,267'Nonreciprocal circuit device'20056,876,269'Nonreciprocal circuit element having excellent signal transmission efficiency and communication apparatus using same'20056,828,872'Irreversible circuit device suppressing drop of insertion loss and achieving compact scale'20046,780,344'Garnet ferrite for low-insertion-loss non-reciprocal circuit, method for preparing the same, and non-reciprocal circuit device including the same'20046,335,418'Functional polyamic acid microfine particles, functional polyimide microfine particles, and processes for their production'20026,040,407'Chain polyene group-containing norbornene compound and unsaturated ethylene copolymer using the same'20005,837,791'Unsaturated copolymer of ethylene and process for preparing the same'19985,718,736'Porous ultrafine grinder'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2011Patents assigned to ALPS ELECTRIC CO LTD (10)· patent assignee history
1998–2011Based in Niigata, JP· patent location history
2000Based in Yamaguchi, JP· patent location history
2002Based in Higashiosaka, JP· patent location history
2014–2020Patents assigned to MITSUI CHEMICALS INC (7)· patent assignee history
2014–2016Patents assigned to ONISHI HITOSHI (3)· patent assignee history
2014–2015Patents assigned to FUJII SHUNSUKE (2)· patent assignee history
2014–2020Based in Chiba, JP· patent location history
2015–2016Patents assigned to MAEKAWA SHINTARO (2)· patent assignee history
2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ALPS ELECTRIC CO LTD101998–2011
MITSUI CHEMICALS INC72014–2020
ONISHI HITOSHIself32014–2016
FUJII SHUNSUKE22014–2015
MAEKAWA SHINTARO22015–2016
Locations
LocationPatentsSpan
Niigata, JP101998–2011
Chiba, JP72014–2020
Tokyo, JP12021
Higashiosaka, JP12002
Yamaguchi, JP12000