Inventor
Roger Alan Lindley
Inventor
Santa Clara, CA, US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H01LSemiconductor devices7%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
E01CConstruction of, or surfaces for, roads, sports grounds, or the like3%
G06FElectric digital data processing3%
G06NComputing arrangements based on specific computational models3%
G16ZInformation and communication technology [ict] specially adapted for specific application fields, not otherwise provided for3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution3%
PatentTitleYear
10,763,150System for coupling a voltage to spatially segmented portions of the wafer with variable voltage202010,688,750Bonding structure of E chuck to aluminum base configuration202010,153,139Multiple electrode substrate support assembly and phase control system20188,936,696'Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor'20158,617,351'Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction'20138,527,081'Method and apparatus for automated validation of semiconductor process recipes'20138,382,939'Plasma processing chamber with enhanced gas delivery'20138,092,605'Magnetic confinement of a plasma'20128,048,328'Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor'20117,972,469'Plasma processing apparatus'20117,883,633'Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor'20117,879,186'Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor'20117,422,654'Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor'20087,374,636'Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor'20087,316,199'Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber'20086,326,307'Plasma pretreatment of photoresist in an oxide etch process'20016,113,731'Magnetically-enhanced plasma chamber with non-uniform magnetic field'20005,989,349'Diagnostic pedestal assembly for a semiconductor wafer processing system'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2020Patents assigned to APPLIED MATERIALS INC (17)· patent assignee history
1999–2020Based in Santa Clara, CA, US· patent location history
2001Patents assigned to APPLLIED MATERIALS INC (1)· patent assignee history
2012–2013Patents assigned to LINDLEY ROGER A (2)· patent assignee history
2013–2015Patents assigned to LINDLEY ROGER ALAN (3)· patent assignee history
2013–2015Patents assigned to HORIOKA KEIJI (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 17 | 1999–2020 |
| LINDLEY ROGER ALANself | 3 | 2013–2015 |
| HORIOKA KEIJI | 2 | 2013–2015 |
| LINDLEY ROGER Aself | 2 | 2012–2013 |
| APPLLIED MATERIALS INC | 1 | 2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Santa Clara, California, US | 18 | 1999–2020 |