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Inventor

Anne-Marie Goethals

Inventor
Oud-Heverlee, BE

Overview

3→
Patents
2010–2015
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
B82YSpecific uses or applications of nanostructures17%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
Y10TTechnical subjects covered by former us classification17%
PatentTitleYear
9,086,638'Detection of contamination in EUV systems'20158,006,202'Systems and methods for UV lithography'20117,750,319'Method and system for measuring contamination of a lithographical element'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2015Patents assigned to IMEC (3)· patent assignee history
2010–2015Based in Oud-Heverlee, BE· patent location history
2015Patents assigned to GOETHALS ANNE-MARIE (1)· patent assignee history
2015Patents assigned to JONCKHEERE RIK (1)· patent assignee history
2015Patents assigned to LORUSSO GIAN FRANCESCO (1)· patent assignee history
2015Patents assigned to POLLENTIER IVAN (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IMEC32010–2015
GOETHALS ANNE-MARIEself12015
JONCKHEERE RIK12015
LORUSSO GIAN FRANCESCO12015
POLLENTIER IVAN12015
Locations
LocationPatentsSpan
Oud-Heverlee, BE32010–2015