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Inventor

King-Chang Shu

Inventor
Taipei, TW

Overview

4→
Patents
2005–2011
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices80%
G06FElectric digital data processing20%
PatentTitleYear
7,934,177'Method and system for a pattern layout split'20117,643,976'Method and system for identifying lens aberration sensitive patterns in an integrated circuit chip'20107,303,841'Repair of photolithography masks by sub-wavelength artificial grating technology'20076,973,636'Method of defining forbidden pitches for a lithography exposure tool'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2011Patents assigned to TAIWAN SEMICONDUCTOR MFG (4)· patent assignee history
2005–2010Based in Taipei, TW· patent location history
2007Based in Hsinchu, TW· patent location history
2011Based in Banciao, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG42005–2011
Locations
LocationPatentsSpan
Taipei, TW22005–2010
Banciao, TW12011
Hsinchu, TW12007