Inventor
DENIS IVANOV
Inventor
RU
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
B24BMachines, devices, or processes for grinding or polishing18%
G06NComputing arrangements based on specific computational models11%
G01BMeasuring length, thickness or similar linear dimensions7%
G01NInvestigating or analysing materials by determining their chemical or physical properties7%
G05BControl or regulating systems in general7%
H01JElectric discharge tubes or discharge lamps4%
H05BElectric heating4%
PatentTitleYear
12,447,577Polishing apparatus using neural network for monitoring202512,370,646Polishing apparatus using machine learning and compensation for pad thickness202512,103,135Core configuration for in-situ electromagnetic induction monitoring system202411,638,982Core configuration for in-situ electromagnetic induction monitoring system202311,524,382Polishing apparatus using machine learning and compensation for pad thickness202211,348,783Methods and apparatus for dynamical control of radial uniformity with two-story microwave cavities2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to APPLIED MATERIALS INC (6)· patent assignee history
2022–2025Based in RU· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 6 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| RU | 6 | 2022–2025 |