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Inventor

Qinzun Lin

Inventor
Guangdong, CN

Overview

2→
Patents
2001–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H01LSemiconductor devices20%
H10DInorganic electric semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
PatentTitleYear
10,950,716Metal oxide TFT, manufacturing method thereof, and display device20216,268,436'Approach to formulating irradiation sensitive positive resists'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Patents assigned to IBM (1)· patent assignee history
2001Based in Wappingers Falls, NY, US· patent location history
2021Patents assigned to SHENZHEN CHINA STAR OPTOELECT (1)· patent assignee history
2021Based in Guangdong, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM12001
SHENZHEN CHINA STAR OPTOELECT12021
Locations
LocationPatentsSpan
Guangdong, CN12021
Wappingers Falls, New York, US12001