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Inventor

Jeon Il Lee

Inventor
Suwon-si, KR

Overview

17→
Patents
2014–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10DInorganic electric semiconductor devices12%
H10BElectronic memory devices9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
B05BSpraying apparatus5%
A01GHorticulture3%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H01JElectric discharge tubes or discharge lamps3%
PatentTitleYear
11,127,601Phosphorus fugitive emission control202110,790,168Plasma treatment apparatus and method of fabricating semiconductor device using the same202010,014,181Methods of forming patterns with multiple layers for semiconductor devices20189,991,281Semiconductor devices and methods of manufacturing the same20189,882,018'Semiconductor device with a tunneling layer having a varying nitrogen concentration, and method of manufacturing the same'20189,754,959'Non-volatile semiconductor devices'20179,716,128'Methods of manufacturing semiconductor devices'20179,595,446'Methods of processing substrates'20179,525,762'Mobile terminal having antenna'20169,482,953'Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the same'20169,412,636'Methods for processing substrates'20169,281,277'Methods of forming wiring structures'20169,252,244'Methods of selectively growing source/drain regions of fin field effect transistor and method of manufacturing semiconductor device including a fin field effect transistor'20169,147,687'Methods of fabricating semiconductor devices'20159,041,122'Semiconductor devices having metal silicide layers and methods of manufacturing such semiconductor devices'20159,023,716'Methods for processing substrates'20158,880,132'Mobile terminal having antenna'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (16)· patent assignee history
2014–2018Patents assigned to LEE JEON IL (2)· patent assignee history
2014–2020Based in Suwon-si, KR· patent location history
2018Patents assigned to AHN JAE YOUNG (1)· patent assignee history
2018Patents assigned to CHOI JAE HO (1)· patent assignee history
2021Patents assigned to APPLIED MATERIALS INC (1)· patent assignee history
2021Based in Andover, MA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD162014–2020
LEE JEON ILself22014–2018
AHN JAE YOUNG12018
APPLIED MATERIALS INC12021
CHOI JAE HO12018
Locations
LocationPatentsSpan
Suwon-si, KR162014–2020
Andover, Massachusetts, US12021