Inventor
MASATOSHI ECHIGO
Inventor
JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Cprimary
C07CAcyclic or carbocyclic compounds19%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds19%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
C07DHeterocyclic compounds13%
C09DCoating compositions, e.g. paints, varnishes or lacquers9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
H01LSemiconductor devices6%
C07BGeneral methods of organic chemistry2%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
12,134,596Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin202411,852,970Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin202311,747,728Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin202311,572,430Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method202311,480,877Resist composition, method for forming resist pattern, and polyphenol compound used therein202211,256,170Compound, resist composition, and method for forming resist pattern using it202211,243,467Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method202211,143,962Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method202111,137,686Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2024Patents assigned to MITSUBISHI GAS CHEMICAL CO (9)· patent assignee history
2021–2024Based in JP· patent location history
2023Patents assigned to A SCHOOL CORPORATION KANSAI UNIV (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI GAS CHEMICAL CO | 9 | 2021–2024 |
| A SCHOOL CORPORATION KANSAI UNIV | 1 | 2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 9 | 2021–2024 |