Inventor

Hiroshi Aida

Inventor
Kokubu, JP

Overview

32→
Patents
1990–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 32 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Tprimary
Y10TTechnical subjects covered by former us classification11%
G01TMeasurement of nuclear or x-radiation10%
C23CCoating metallic material9%
C04BLime, magnesia7%
G21KHandling of particles or ionising radiation not otherwise provided for7%
B29CShaping or joining of plastics6%
F16DCouplings for transmitting rotation6%
F16HGearing6%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form4%
H02KDynamo-electric machines4%
PatentTitleYear
10,916,983Permanent-magnet motor202110,910,892Rotary electric machine and electric power steering apparatus202110,374,474Permanent magnet motor201910,007,004Apparatus and method of manufacturing radiation detection panel20189,964,652Apparatus and method of manufacturing radiation detection panel20189,897,705'Radiation detector, scintillator panel, and method for manufacturing the same'20189,880,292'Apparatus and method of manufacturing radiation detection panel'20189,720,106'Radiation detector and scintillator panel, and methods for manufacturing same'20177,910,892'Method for manufacturing X-ray detector and X-ray detector'20117,455,394'Inkjet head'20087,276,706'Radiation detector'20077,108,113'One-way clutch built-in type rotation transmission device'2006RE039120'Ceramic sintered product and process for producing the same'20067,053,380'X-ray detector and method for producing X-ray detector'20067,044,587'Actuator, its manufacturing method and printing head'20066,957,728'Pulley apparatus with built-in roller clutch and the assembly method thereof'20056,916,559'Ceramic material resistant to halogen plasma and member utilizing the same'20056,880,689'Pulley apparatus with built-in roller clutch and assembly method thereof'20056,513,633'Rotation transmitting device incorporating one-way clutch therein'20036,447,937'Ceramic materials resistant to halogen plasma and components using the same'20026,380,674'X-ray image detector'20026,265,334'Ceramic sintered product and process for producing the same'20015,958,813'Semi-insulating aluminum nitride sintered body'19995,886,863'Wafer support member'19995,777,543'Ceramic resistor and electrostatic chuck having an aluminum nitride crystal phase'19985,668,524'Ceramic resistor and electrostatic chuck having an aluminum nitride crystal phase'19975,653,932'Injection molding method for preventing formation of surface defects and mold assembly therefor'19975,540,581'Mold for injection molding a thermoplastic part free from sink marks using a void inducing member'19965,275,798'Method for producing diamond films'19945,232,654'Injection molding method for manufacturing a thermoplastic part free from sink marks using a void inducing member'19935,225,275'Method of producing diamond films'19934,963,087'Expansion injection molding die'1990

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990–1997Patents assigned to NIPPON STEEL CHEMICAL CO (4)· patent assignee history
1993–2008Patents assigned to KYOCERA CORP (11)· patent assignee history
1993–2005Based in Kanagawa, JP· patent location history
1997–2006Based in Kokubu, JP· patent location history
1999–2008Based in Kagoshima, JP· patent location history
2002–2018Based in Otawara, JP· patent location history
2003–2021Patents assigned to MITSUBISHI ELECTRIC CORP (4)· patent assignee history
2003–2006Patents assigned to NSK LTD (4)· patent assignee history
2007–2018Patents assigned to TOSHIBA ELECTRON TUBES & DEVIC (7)· patent assignee history
2019–2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KYOCERA CORP111993–2008
TOSHIBA ELECTRON TUBES & DEVIC72007–2018
MITSUBISHI ELECTRIC CORP42003–2021
NIPPON STEEL CHEMICAL CO41990–1997
NSK LTD42003–2006
Locations
LocationPatentsSpan
Kokubu, JP81997–2006
Otawara, JP72002–2018
Kanagawa, JP41993–2005
Tokyo, JP32019–2021
Kagoshima, JP21999–2008