Inventor

Pascal Ruffieux

Inventor
Plasselb, CH

Overview

4→
Patents
2016–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C01Bprimary
C01BNon-metallic elements31%
B82YSpecific uses or applications of nanostructures23%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds15%
C07CAcyclic or carbocyclic compounds8%
C07DHeterocyclic compounds8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
Y10TTechnical subjects covered by former us classification8%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016–2019Patents assigned to BASF SE (4)· patent assignee history
2016Based in Plassalb, CH· patent location history
2017Patents assigned to EMPA-EIDGENOESSISCHE MATERIALPRUEFUNGS-UND FORSCHUNGSANSTALT (1)· patent assignee history
2017Patents assigned to EMPA—EIDGENOESSISCHE MATERIALPRUEFUNGS- UND FORSCHUNGSANSTALT (1)· patent assignee history
2017–2019Based in Plasselb, CH· patent location history
2018Patents assigned to EMPA MATERIALS SCIENCE AND TECH (1)· patent assignee history
2019Patents assigned to EMPA EIDGENOESSISCHE MAT & FORSCHUNGSANSTALT (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
BASF SE42016–2019
EMPA EIDGENOESSISCHE MAT & FORSCHUNGSANSTALT12019
EMPA MATERIALS SCIENCE AND TECH12018
EMPA-EIDGENOESSISCHE MATERIALPRUEFUNGS-UND FORSCHUNGSANSTALT12017
EMPA—EIDGENOESSISCHE MATERIALPRUEFUNGS- UND FORSCHUNGSANSTALT12017
Locations
LocationPatentsSpan
Plasselb, CH32017–2019
Plassalb, CH12016