Inventor
Dae-Hyuk Chung
Inventor
Seongnam-si, KR
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H10DInorganic electric semiconductor devices15%
H10BElectronic memory devices13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
C11DDetergent compositions8%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
G05BControl or regulating systems in general6%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling4%
H01JElectric discharge tubes or discharge lamps4%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
PatentTitleYear
9,760,083'Apparatus and method for detecting damage to tool in machine'20179,684,299'Apparatus and method for managing machine tool information for heterogeneous numerical control devices'20179,507,340'Tool path part program modification system of NC machine tool'20168,962,455'Method of fabricating semiconductor device'20158,723,297'Memory device'20148,551,288'Apparatus and method for removing a photoresist structure from a substrate'20137,799,687'Slurry composition for a chemical mechanical polishing process and method of manufacturing a semiconductor device using the slurry composition'20107,573,132'Wiring structure of a semiconductor device and method of forming the same'20097,527,921'Method of treating and removing a photoresist pattern and method of manufacturing a semiconductor device using the same'20097,405,164'Apparatus and method for removing a photoresist structure from a substrate'20086,946,431'Cleaning solution including aqueous ammonia solution, acetic acid and deionized water for integrated circuit devices and methods of cleaning integrated circuit devices using the same'20056,875,706'Cleaning solution and method of cleaning a semiconductor device using the same'20056,740,550'Methods of manufacturing semiconductor devices having chamfered silicide layers therein'20046,706,633'Method of forming a self-aligned contact pad for use in a semiconductor device'20046,451,663'Method of manufacturing a cylindrical storage node in a semiconductor device'20026,437,411'Semiconductor device having chamfered silicide layer and method for manufacturing the same'20026,406,967'Method for manufacturing cylindrical storage electrode of semiconductor device'20026,369,008'Cleaning solutions for removing contaminants from the surfaces of semiconductor substrates and cleaning methods using the same'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2015Patents assigned to SAMSUNG ELECTRONICS CO LTD (15)· patent assignee history
2002–2017Based in Kyungki-do, KR· patent location history
2002–2004Based in Sungnam, KR· patent location history
2005Based in Gyeonggi-do, KR· patent location history
2008–2015Based in Seongnam-si, KR· patent location history
2013–2014Patents assigned to CHUNG DAE-HYUK (2)· patent assignee history
2013–2014Patents assigned to HWANG IN-SEAK (2)· patent assignee history
2016–2017Patents assigned to DOOSAN MACHINE TOOLS CO LTD (3)· patent assignee history
2016–2017Patents assigned to CHUNG DAE HYUK (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 15 | 2002–2015 |
| DOOSAN MACHINE TOOLS CO LTD | 3 | 2016–2017 |
| CHUNG DAE HYUKself | 2 | 2016–2017 |
| CHUNG DAE-HYUKself | 2 | 2013–2014 |
| HWANG IN-SEAK | 2 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seongnam-si, KR | 7 | 2008–2015 |
| Kyungki-do, KR | 6 | 2002–2017 |
| Sungnam, KR | 3 | 2002–2004 |
| Gyeonggi-do, KR | 2 | 2005 |