Inventor
Keith J. Machia
Inventor
Swanton, VT, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them25%
H01LSemiconductor devices13%
H10DInorganic electric semiconductor devices13%
PatentTitleYear
9,570,564'Self-aligned emitter-base bipolar junction transistor with reduced base resistance and base-collector capacitance'20176,944,578'Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus'20056,917,901'Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus'20056,856,378'Method of photolithographic exposure dose control as a function of resist sensitivity'20056,674,516'Method of photolithographic exposure dose control as a function of resist sensitivity'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2005Patents assigned to IBM (4)· patent assignee history
2004–2017Based in Swanton, VT, US· patent location history
2017Patents assigned to GLOBALFOUNDRIES INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 4 | 2004–2005 |
| GLOBALFOUNDRIES INC | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Swanton, VT, US | 5 | 2004–2017 |