Inventor
Masaru Ohto
Inventor
Tokyo, JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C11DDetergent compositions13%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
H01LSemiconductor devices13%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems8%
C23FNon-mechanical removal of metallic material from surface8%
C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis8%
C09KMaterials for miscellaneous applications, not provided for elsewhere5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
C08JWorking-up3%
PatentTitleYear
9,587,208'Cleaning liquid composition, method for cleaning semiconductor element, and method for manufacturing semiconductor element'20179,422,512'Cleaning liquid for semiconductor elements and cleaning method using same'20169,334,161'Processing liquid for suppressing pattern collapse of fine metal structure and method for producing fine metal structure using same'20169,196,472'Processing liquid for suppressing pattern collapse of fine metal structure, and method for producing fine metal structure using same'20158,980,812'Treatment liquid for inhibiting pattern collapse in microstructures, and microstructure manufacturing method using said treatment liquid'20158,658,053'Etching composition for metal material and method for manufacturing semiconductor device by using same'20147,977,292'Cleaning composition and process for producing semiconductor device'20117,572,758'Cleaning liquid and cleaning method'20096,475,373'Method of controlling NOx gas emission by hydrogen peroxide'20025,185,185'Process of pretreatment of metal-plating resin molded articles'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2017Patents assigned to MITSUBISHI GAS CHEMICAL CO (10)· patent assignee history
1993–2017Based in Tokyo, JP· patent location history
2011–2015Based in Chiba, JP· patent location history
2014–2016Patents assigned to OHTO MASARU (4)· patent assignee history
2014Patents assigned to ABE KOJIRO (1)· patent assignee history
2015–2016Patents assigned to MATSUNAGA HIROSHI (3)· patent assignee history
2015–2016Patents assigned to YAMADA KENJI (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI GAS CHEMICAL CO | 10 | 1993–2017 |
| OHTO MASARUself | 4 | 2014–2016 |
| MATSUNAGA HIROSHI | 3 | 2015–2016 |
| YAMADA KENJI | 2 | 2015–2016 |
| ABE KOJIRO | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 7 | 1993–2017 |
| Chiba, JP | 3 | 2011–2015 |