Inventor
Henan ZHANG
Inventor
US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
G06TImage data processing or generation, in general11%
G06VImage or video recognition or understanding9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
G06NComputing arrangements based on specific computational models7%
G06FElectric digital data processing5%
C23CCoating metallic material4%
H01JElectric discharge tubes or discharge lamps4%
H04NPictorial communication, e.g. television4%
PatentTitleYear
12,598,747Fabricating three-dimensional semiconductor structures202612,482,702Wet etch process and methods to form air gaps between metal interconnects202512,400,872Sacrificial capping layer for gate protection202512,243,749Methods to provide uniform wet etching of material within high aspect ratio features provided on a patterned substrate202512,237,216Method for filling recessed features in semiconductor devices with a low-resistivity metal202512,148,625Methods to prevent surface charge induced cd-dependent etching of material formed within features on a patterned substrate202412,148,624Wet etch process and method to control fin height and channel area in a fin field effect transistor (FinFET)202412,100,599Wet etch process and method to provide uniform etching of material formed within features having different critical dimension (CD)202412,100,598Methods for planarizing a substrate using a combined wet etch and chemical mechanical polishing (CMP) process202411,875,601Meme generation method, electronic device and storage medium202411,810,310Satellite image processing method, network training method, related devices and electronic device202311,748,895Method and apparatus for processing video frame202311,710,624Sputtering method202311,568,590Cartoonlization processing method for image, electronic device, and storage medium202311,532,517Localized etch stop layer202211,463,631Method and apparatus for generating face image202211,455,765Method and apparatus for generating virtual avatar202211,424,123Forming a semiconductor feature using atomic layer etch202211,315,768Loading apparatus and physical vapor deposition apparatus202211,289,325Radiation of substrates during processing and systems thereof2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to TOKYO ELECTRON LTD (12)· patent assignee history
2022–2024Patents assigned to BEIJING BAIDU NETCOM SCI & TECH CO LTD (6)· patent assignee history
2022–2023Patents assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (2)· patent assignee history
2022–2026Based in US· patent location history
2022–2024Based in CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 12 | 2022–2026 |
| BEIJING BAIDU NETCOM SCI & TECH CO LTD | 6 | 2022–2024 |
| BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD | 2 | 2022–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 12 | 2022–2026 |
| CN | 8 | 2022–2024 |