Inventor

Raymond Jacobus Wilhelmus Knaapen

Inventor

Helmond, NL

Overview

2009–2020

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary

B82YSpecific uses or applications of nanostructures26%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%

B29CShaping or joining of plastics23%

C23CCoating metallic material6%

B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%

B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units3%

H01LSemiconductor devices3%

H10KOrganic electric solid-state devices3%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%

Y10TTechnical subjects covered by former us classification3%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2009–2020Patents assigned to ASML NETHERLANDS BV (9)· patent assignee history

2009–2020Based in Helmond, NL· patent location history

2012–2014Patents assigned to DIJKSMAN JOHAN FREDERIK (3)· patent assignee history

2012–2014Patents assigned to KRUIJT-STEGEMAN YVONNE WENDELA (3)· patent assignee history

2012–2014Patents assigned to WUISTER SANDER FREDERIK (3)· patent assignee history

2012–2014Patents assigned to KNAAPEN RAYMOND JACOBUS (2)· patent assignee history

2017Based in Delft, NL· patent location history

2019Based in 's-Hertogenbosch, NL· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	9	2009–2020
DIJKSMAN JOHAN FREDERIK	3	2012–2014
KRUIJT-STEGEMAN YVONNE WENDELA	3	2012–2014
WUISTER SANDER FREDERIK	3	2012–2014
KNAAPEN RAYMOND JACOBUSself	2	2012–2014

Locations